• Source: Scopus
  • Calculated based on no. of publications stored in Pure and citations from Scopus
19962021

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  • 1996

    Fabrication of Si nanostructures for single electron device applications by anisotropic etching

    Hiramoto, T., Ishikuro, H., Saito, K., Fujii, T., Saraya, T., Hashiguchi, G. & Ikoma, T., 1996 Dec 1, Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers. Aoyagi, Y., Atoda, N., Fukui, T., Komuro, M., Kotera, M. & et al, A. (eds.). 12 B ed. p. 6347-6695 349 p. (Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers; vol. 35, no. 12 B).

    Research output: Chapter in Book/Report/Conference proceedingChapter

    2 Citations (Scopus)