A comparative study of an unbalanced magnetron with dielectric substrate with a conventional magnetron through the use of hybrid modelling

Eiji Shidoji, Eiichi Ando, Toshiaki Makabe

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The influence of the differing magnetic field arrangements in both an unbalanced magnetron (UBM) and balanced magnetron (BM), both of which employ a dielectric substrate, on plasma characteristics has been numerically investigated under identical pressures and voltages. The UBM exhibits some interesting intrinsic characteristics with regard to the bulk plasma and the incident flux on the dielectric substrate. A property unique to the UBM is the appearance of negative plasma potential owing to the slightly excess amount of electrons when a magnetic field is arranged parallel to the axis of the bulk plasma in a cylindrical reactor and an electric field is arranged transversely to this axis. The dielectric substrate is negatively deep-biased, as compared with that in the BM, and is exposed to positive ion impact with a higher energy and flux, which will be controlled by changing the magnitude and direction of the external magnetic field.

Original languageEnglish
Pages (from-to)621-626
Number of pages6
JournalPlasma Sources Science and Technology
Volume10
Issue number4
DOIs
Publication statusPublished - 2001 Nov

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magnetic fields
ion impact
plasma potentials
positive ions
reactors
electric fields
electric potential
electrons
energy

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Condensed Matter Physics

Cite this

A comparative study of an unbalanced magnetron with dielectric substrate with a conventional magnetron through the use of hybrid modelling. / Shidoji, Eiji; Ando, Eiichi; Makabe, Toshiaki.

In: Plasma Sources Science and Technology, Vol. 10, No. 4, 11.2001, p. 621-626.

Research output: Contribution to journalArticle

@article{e53a066b1e4a4cf19347e4ef5bf4e8c1,
title = "A comparative study of an unbalanced magnetron with dielectric substrate with a conventional magnetron through the use of hybrid modelling",
abstract = "The influence of the differing magnetic field arrangements in both an unbalanced magnetron (UBM) and balanced magnetron (BM), both of which employ a dielectric substrate, on plasma characteristics has been numerically investigated under identical pressures and voltages. The UBM exhibits some interesting intrinsic characteristics with regard to the bulk plasma and the incident flux on the dielectric substrate. A property unique to the UBM is the appearance of negative plasma potential owing to the slightly excess amount of electrons when a magnetic field is arranged parallel to the axis of the bulk plasma in a cylindrical reactor and an electric field is arranged transversely to this axis. The dielectric substrate is negatively deep-biased, as compared with that in the BM, and is exposed to positive ion impact with a higher energy and flux, which will be controlled by changing the magnitude and direction of the external magnetic field.",
author = "Eiji Shidoji and Eiichi Ando and Toshiaki Makabe",
year = "2001",
month = "11",
doi = "10.1088/0963-0252/10/4/311",
language = "English",
volume = "10",
pages = "621--626",
journal = "Plasma Sources Science and Technology",
issn = "0963-0252",
publisher = "IOP Publishing Ltd.",
number = "4",

}

TY - JOUR

T1 - A comparative study of an unbalanced magnetron with dielectric substrate with a conventional magnetron through the use of hybrid modelling

AU - Shidoji, Eiji

AU - Ando, Eiichi

AU - Makabe, Toshiaki

PY - 2001/11

Y1 - 2001/11

N2 - The influence of the differing magnetic field arrangements in both an unbalanced magnetron (UBM) and balanced magnetron (BM), both of which employ a dielectric substrate, on plasma characteristics has been numerically investigated under identical pressures and voltages. The UBM exhibits some interesting intrinsic characteristics with regard to the bulk plasma and the incident flux on the dielectric substrate. A property unique to the UBM is the appearance of negative plasma potential owing to the slightly excess amount of electrons when a magnetic field is arranged parallel to the axis of the bulk plasma in a cylindrical reactor and an electric field is arranged transversely to this axis. The dielectric substrate is negatively deep-biased, as compared with that in the BM, and is exposed to positive ion impact with a higher energy and flux, which will be controlled by changing the magnitude and direction of the external magnetic field.

AB - The influence of the differing magnetic field arrangements in both an unbalanced magnetron (UBM) and balanced magnetron (BM), both of which employ a dielectric substrate, on plasma characteristics has been numerically investigated under identical pressures and voltages. The UBM exhibits some interesting intrinsic characteristics with regard to the bulk plasma and the incident flux on the dielectric substrate. A property unique to the UBM is the appearance of negative plasma potential owing to the slightly excess amount of electrons when a magnetic field is arranged parallel to the axis of the bulk plasma in a cylindrical reactor and an electric field is arranged transversely to this axis. The dielectric substrate is negatively deep-biased, as compared with that in the BM, and is exposed to positive ion impact with a higher energy and flux, which will be controlled by changing the magnitude and direction of the external magnetic field.

UR - http://www.scopus.com/inward/record.url?scp=0035506927&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035506927&partnerID=8YFLogxK

U2 - 10.1088/0963-0252/10/4/311

DO - 10.1088/0963-0252/10/4/311

M3 - Article

VL - 10

SP - 621

EP - 626

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

SN - 0963-0252

IS - 4

ER -