A novel sustaining mechanism in capacitively coupled radio frequency plasma in oxygen

Mari Shibata, Toshiaki Makabe, Nobuhiko Nakano

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Abstract

This study presents numerical evidence regarding a new type of self-sustaining mechanism for capacitively-coupled-radiofrequency plasma utilizing a self-consistent relaxation continuum model. The regime's existence depends on an electron source, produced by a detachment reaction from negative ions with high density in the bulk plasma, under a system that the spatiotemporal total rate of electron attachment is greater than that of ionization. That is, a novel mechanism differs markedly from previous ones that radiofrequency plasmas are mainly sustained by the ionization multiplication of low density electrons in a sheath/plasma boundary. The consequences of this finding are discussed from both charge balance and reaction sequence balance in the bulk plasma at 13.56 MHz in oxygen.

Original languageEnglish
Pages (from-to)4182-4185
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume37
Issue number7
Publication statusPublished - 1998 Jul 1

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Keywords

  • Capacitively-coupled-plasma
  • Electron attachment
  • Electron detachment
  • Negative ions
  • Novel sustaining mechanism
  • Oxygen plasma
  • RCT model
  • rf plasma

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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