A Study of Gray Scale Lithography with Micro Chrome Pattern

Kei Hanai; Yoshinori Matsumoto

doi:10.1541/ieejsmas.123.410

A Study of Gray Scale Lithography with Micro Chrome Pattern

Kei Hanai, Yoshinori Matsumoto

Department of Applied Physics and Physico-Informatics

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Gray scale lithography has been recently researched to make 3D structures such as a microlens, prism etc. In this research, a novel gray scale mask was fabricated by chrome mask and EB lithography system that can apply bitmap data (tiff form file) to drawing data. The gray scale was realized using half-tone pattern which consists of array of micro spots (diameters are 0.2μm - 1.6μm). Thick positive UV resist (AZ-p4620) on Si was exposed, defocusing the half-tone pattern by holding the gap of 80μm. Relation between gray scale value and depth was examined, and Fresnel lens pattern was formed on the resist.

Original language	English
Pages (from-to)	410-415
Number of pages	6
Journal	ieej transactions on sensors and micromachines
Volume	123
Issue number	10
DOIs	https://doi.org/10.1541/ieejsmas.123.410
Publication status	Published - 2003

Keywords

3D
EB lithography
chrome mask
gray scale mask
half-tone
thick resist

ASJC Scopus subject areas

Mechanical Engineering
Electrical and Electronic Engineering

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10.1541/ieejsmas.123.410

Cite this

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title = "A Study of Gray Scale Lithography with Micro Chrome Pattern",

abstract = "Gray scale lithography has been recently researched to make 3D structures such as a microlens, prism etc. In this research, a novel gray scale mask was fabricated by chrome mask and EB lithography system that can apply bitmap data (tiff form file) to drawing data. The gray scale was realized using half-tone pattern which consists of array of micro spots (diameters are 0.2μm - 1.6μm). Thick positive UV resist (AZ-p4620) on Si was exposed, defocusing the half-tone pattern by holding the gap of 80μm. Relation between gray scale value and depth was examined, and Fresnel lens pattern was formed on the resist.",

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AU - Hanai, Kei

AU - Matsumoto, Yoshinori

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AB - Gray scale lithography has been recently researched to make 3D structures such as a microlens, prism etc. In this research, a novel gray scale mask was fabricated by chrome mask and EB lithography system that can apply bitmap data (tiff form file) to drawing data. The gray scale was realized using half-tone pattern which consists of array of micro spots (diameters are 0.2μm - 1.6μm). Thick positive UV resist (AZ-p4620) on Si was exposed, defocusing the half-tone pattern by holding the gap of 80μm. Relation between gray scale value and depth was examined, and Fresnel lens pattern was formed on the resist.

KW - 3D

KW - EB lithography

KW - chrome mask

KW - gray scale mask

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A Study of Gray Scale Lithography with Micro Chrome Pattern

Abstract

Keywords

ASJC Scopus subject areas

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