A two-step process for growth of highly oriented Sb2Te3 using sputtering

Yuta Saito, Paul Fons, Leonid Bolotov, Noriyuki Miyata, Alexander V. Kolobov, Junji Tominaga

Research output: Contribution to journalArticle

24 Citations (Scopus)


A two-step growth method is proposed for the fabrication of highly-oriented Sb2Te3 and related superlattice films using sputtering. We report that the quality and grain size of Sb2Te3 as well as GeTe/Sb2Te3 superlattice films strongly depend on the thickness of the room-temperature deposited and subsequently by annealing at 523 K Sb2Te3 seed layer. This result may open up new possibilities for the fabrication of two-dimensional electronic devices using layered chalcogenides.

Original languageEnglish
Article number045220
JournalAIP Advances
Issue number4
Publication statusPublished - 2016 Apr 1
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'A two-step process for growth of highly oriented Sb<sub>2</sub>Te<sub>3</sub> using sputtering'. Together they form a unique fingerprint.

  • Cite this

    Saito, Y., Fons, P., Bolotov, L., Miyata, N., Kolobov, A. V., & Tominaga, J. (2016). A two-step process for growth of highly oriented Sb2Te3 using sputtering. AIP Advances, 6(4), [045220]. https://doi.org/10.1063/1.4948536