Alkyl and alkoxyl monolayers directly attached to silicon: Chemical durability in aqueous solutions

Hikaru Sano, Hajime Maeda, Takashi Ichii, Kuniaki Murase, Kei Noda, Kazumi Matsushige, Hiroyuki Sugimura

Research output: Contribution to journalArticle

43 Citations (Scopus)

Abstract

For practical application of self-assembled monolayers (SAMs), knowledge of their chemical durability in acidic or basic solutions is important. In the present work, a series of SAMs directly immobilized on a silicon (111) surface through Si-CorSi-O-C covalent bonds without a native oxide layer were prepared by thermally activated chemical reactions of a hydrogen-terminated Si(111) substrate with linear molecules, i.e., 1-hexadecene, 1-hexadecanol, 1- dodecanol, and n-dodecanal, to investigate the durability of the SAMs to HF and Na2CO3 solutions. While grazing incidence X-ray reflectivity measurements showed that all the as-prepared SAMs had almost the same film density and molecular coverage, keeping the original step and terrace structure of Si(111) as is observed by atomic force microscopy, they gave different degradation behaviors, i.e., pitting and concomitant surface roughening in both solutions. 1- Hexadecene SAM was stable against immersion in both solutions, while the other SAMs were damaged within 60 min, most likely due to the difference in chemical bonding modes at the SAM/Si interface, i.e., Si-C and Si-O-C.

Original languageEnglish
Pages (from-to)5516-5525
Number of pages10
JournalLangmuir
Volume25
Issue number10
DOIs
Publication statusPublished - 2009 May 19
Externally publishedYes

Fingerprint

Self assembled monolayers
Silicon
durability
Monolayers
Durability
aqueous solutions
silicon
pitting
covalent bonds
grazing incidence
submerging
Dodecanol
chemical reactions
atomic force microscopy
degradation
Covalent bonds
reflectance
oxides
Pitting
Oxides

ASJC Scopus subject areas

  • Electrochemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Materials Science(all)
  • Spectroscopy

Cite this

Sano, H., Maeda, H., Ichii, T., Murase, K., Noda, K., Matsushige, K., & Sugimura, H. (2009). Alkyl and alkoxyl monolayers directly attached to silicon: Chemical durability in aqueous solutions. Langmuir, 25(10), 5516-5525. https://doi.org/10.1021/la804080g

Alkyl and alkoxyl monolayers directly attached to silicon : Chemical durability in aqueous solutions. / Sano, Hikaru; Maeda, Hajime; Ichii, Takashi; Murase, Kuniaki; Noda, Kei; Matsushige, Kazumi; Sugimura, Hiroyuki.

In: Langmuir, Vol. 25, No. 10, 19.05.2009, p. 5516-5525.

Research output: Contribution to journalArticle

Sano, H, Maeda, H, Ichii, T, Murase, K, Noda, K, Matsushige, K & Sugimura, H 2009, 'Alkyl and alkoxyl monolayers directly attached to silicon: Chemical durability in aqueous solutions', Langmuir, vol. 25, no. 10, pp. 5516-5525. https://doi.org/10.1021/la804080g
Sano, Hikaru ; Maeda, Hajime ; Ichii, Takashi ; Murase, Kuniaki ; Noda, Kei ; Matsushige, Kazumi ; Sugimura, Hiroyuki. / Alkyl and alkoxyl monolayers directly attached to silicon : Chemical durability in aqueous solutions. In: Langmuir. 2009 ; Vol. 25, No. 10. pp. 5516-5525.
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