Analysis of the H- ion emissive surface in the extraction region of negative ion sources

N. Kameyama, T. Fukuyama, S. Wada, S. Kuppel, K. Tsumori, H. Nakano, A. Hatayama, K. Miyamoto, A. Fukano, M. Bacal

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Abstract

To understand the plasma characteristics in the extraction region of negative H- sources is very important for the optimization of H - extraction from the sources. The profile of plasma density and electrostatic potential in the extraction region with and without extraction grid voltage are analyzed with a 2D particle in cell modeling of the NIFS-RD H- sources. The simulation results make clear the physical process forming a double ion plasma layer (which consists only of positive H+ and negative H- ions) recently observed in the Cs-seeded experiments of the NIFS-RD source in the vicinity of the extraction hole and the plasma grid. The results also give a useful insight into the formation mechanism of the plasma meniscus and the H- extraction process for such double ion plasma.

Original languageEnglish
Article number02A721
JournalReview of Scientific Instruments
Volume83
Issue number2
DOIs
Publication statusPublished - 2012 Feb

ASJC Scopus subject areas

  • Instrumentation

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    Kameyama, N., Fukuyama, T., Wada, S., Kuppel, S., Tsumori, K., Nakano, H., Hatayama, A., Miyamoto, K., Fukano, A., & Bacal, M. (2012). Analysis of the H- ion emissive surface in the extraction region of negative ion sources. Review of Scientific Instruments, 83(2), [02A721]. https://doi.org/10.1063/1.3673495