Argon metastable state densities in inductively coupled plasma in mixtures of Ar and O2

Y. Hayashi, S. Hirao, Y. Zhang, T. Gans, D. O'Connell, Z. Lj Petrović, T. Makabe

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23 Citations (Scopus)

Abstract

We have measured the densities of 1s5 and 1s3 argon metastables as a function of the abundance of molecular oxygen in an inductively coupled plasma (ICP) in mixtures of Ar and O2. Laser absorption spectroscopy was used to determine the densities of the metastables. It was found that even small abundances of oxygen lead to large increases in metastable density, mostly due to the reduction in the electron number density, since electron-induced quenching determines the metastable density. At abundances higher than 7% to 15% for powers between 50 and 150 W, quenching by oxygen molecules begins to dominate and the metastable density drops again.

Original languageEnglish
Article number145206
JournalJournal of Physics D: Applied Physics
Volume42
Issue number14
DOIs
Publication statusPublished - 2009 Sep 21

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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    Hayashi, Y., Hirao, S., Zhang, Y., Gans, T., O'Connell, D., Petrović, Z. L., & Makabe, T. (2009). Argon metastable state densities in inductively coupled plasma in mixtures of Ar and O2. Journal of Physics D: Applied Physics, 42(14), [145206]. https://doi.org/10.1088/0022-3727/42/14/145206