Automatic film formation system for ultra-thin organic heterostructure by mass-controlled layer-by-layer sequential adsorption method within one nanometer interface roughness

Seimei Shiratori, Takahiro Ito

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

An automatic film formation system using an enhanced mass-controlled layer-by-layer sequential adsorption process was newly developed for the fabrication of ultra-thin organic films formed by various polymers, monomers, and inorganic materials. This technique can be applied to both water solutions and volatile solvents. In this process, a quartz crystal microbalance (QCM) was attached to the arm of a robot and the frequency shifts during the adsorption of the materials were monitored. By feeding back the data acquired by the QCM from the deposition to the dipping time, a high quality self-assembly film was produced. As a result, the interface roughness between the layers can be controlled within one nanometer. The cross-sectional TEM (transmission electron microscopy) observation of the films formed by the conventional time controlled dipping method and the newly established mass-controlled dipping method reveals that the interface of the heterostructure of the latter was much smoother than the former. In addition, this automatic dipping system can be applied not only for polyelectrolytes, but also for inorganic materials.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsS.C. Moss
Pages39-44
Number of pages6
Volume728
Publication statusPublished - 2002
EventFunctional Nanostructured Materials through Multiscale Assembly and Novel Pattering Techniques - San Francisco, CA, United States
Duration: 2002 Apr 22002 Apr 5

Other

OtherFunctional Nanostructured Materials through Multiscale Assembly and Novel Pattering Techniques
CountryUnited States
CitySan Francisco, CA
Period02/4/202/4/5

Fingerprint

Heterojunctions
Surface roughness
Adsorption
Quartz crystal microbalances
Polyelectrolytes
Self assembly
Polymers
Monomers
Robots
Transmission electron microscopy
Fabrication
Water

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Shiratori, S., & Ito, T. (2002). Automatic film formation system for ultra-thin organic heterostructure by mass-controlled layer-by-layer sequential adsorption method within one nanometer interface roughness. In S. C. Moss (Ed.), Materials Research Society Symposium - Proceedings (Vol. 728, pp. 39-44)

Automatic film formation system for ultra-thin organic heterostructure by mass-controlled layer-by-layer sequential adsorption method within one nanometer interface roughness. / Shiratori, Seimei; Ito, Takahiro.

Materials Research Society Symposium - Proceedings. ed. / S.C. Moss. Vol. 728 2002. p. 39-44.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Shiratori, S & Ito, T 2002, Automatic film formation system for ultra-thin organic heterostructure by mass-controlled layer-by-layer sequential adsorption method within one nanometer interface roughness. in SC Moss (ed.), Materials Research Society Symposium - Proceedings. vol. 728, pp. 39-44, Functional Nanostructured Materials through Multiscale Assembly and Novel Pattering Techniques, San Francisco, CA, United States, 02/4/2.
Shiratori S, Ito T. Automatic film formation system for ultra-thin organic heterostructure by mass-controlled layer-by-layer sequential adsorption method within one nanometer interface roughness. In Moss SC, editor, Materials Research Society Symposium - Proceedings. Vol. 728. 2002. p. 39-44
Shiratori, Seimei ; Ito, Takahiro. / Automatic film formation system for ultra-thin organic heterostructure by mass-controlled layer-by-layer sequential adsorption method within one nanometer interface roughness. Materials Research Society Symposium - Proceedings. editor / S.C. Moss. Vol. 728 2002. pp. 39-44
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