Carbon nanotubes for VLSI: Interconnect and transistor applications

Y. Awano, S. Sato, M. Nihei, T. Sakai, Y. Ohno, T. Mizutani

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    We report the present status of Carbon Nanotube (CNT) CVD material technologies and their applications for via interconnects and FETs for VLSI. We succeeded in growing multi-walled CNTs (MWNTs) with the highest shell density (as high as 1013/cm2) and in fabricating via interconnects with high robustness against a high current density. We also report a Si-process compatible technique to control carrier polarity of Single-walled CNT (SWNT) FETs by utilizing fixed charges introduced by the gate oxide. High-performance p- and n-type CNT-FETs and CMOS inverters with stability in air have been realized.

    Original languageEnglish
    Title of host publicationProceedings of 2011 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA 2011
    Pages10-11
    Number of pages2
    DOIs
    Publication statusPublished - 2011 Jul 11
    Event2011 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA 2011 - Hsinchu, Taiwan, Province of China
    Duration: 2011 Apr 252011 Apr 27

    Publication series

    NameInternational Symposium on VLSI Technology, Systems, and Applications, Proceedings

    Other

    Other2011 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA 2011
    CountryTaiwan, Province of China
    CityHsinchu
    Period11/4/2511/4/27

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Electrical and Electronic Engineering

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  • Cite this

    Awano, Y., Sato, S., Nihei, M., Sakai, T., Ohno, Y., & Mizutani, T. (2011). Carbon nanotubes for VLSI: Interconnect and transistor applications. In Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA 2011 (pp. 10-11). [5872210] (International Symposium on VLSI Technology, Systems, and Applications, Proceedings). https://doi.org/10.1109/VTSA.2011.5872210