Abstract
We demonstrate the growth of ZnO nanorods on a Si(100) substrate through a two-step process, annealing and off-axis pulsed laser deposition (PLD), without a catalyst. ZnO powder was first dispersed on the Si substrate, and annealed to form seeds for ZnO nanorod growth for 2.5 h. In the second step, ZnO was deposited on the seeds by PLD for 1 h. It was experimentally confirmed that the surface morphology after annealing acts as growth nuclei of nanorods. Controlling growth parameters during deposition enables the adjustment of the sizes of nanorods, namely, diameter and length. The diameters of the grown nanorods are 50-700nm and the lengths are 2-10μm. Cathode luminescence (CL) spectra were used to evaluate the states of defects within the ZnO nanorods. According to the CL measurement results, the thinnest nanorod arrays were found to have fewer detects, and more detects were introduced as nanorods became thicker.
| Original language | English |
|---|---|
| Pages (from-to) | 4799-4802 |
| Number of pages | 4 |
| Journal | Japanese Journal of Applied Physics |
| Volume | 47 |
| Issue number | 6 PART 1 |
| DOIs | |
| Publication status | Published - 2008 Jun 13 |
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Keywords
- Annealing
- Catalyst-free
- Nanorod
- Off-axis pulsed-laser deposition
- Zinc oxide
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)
Cite this
Catalyst-free growth of high-quality ZnO nanorods on Si(100) substrate by two-step, off-axis pulsed-laser deposition. / Nishimura, Ryo; Sakano, Tatsunori; Okato, Takeshi; Saiki, Toshiharu; Obara, Minoru.
In: Japanese Journal of Applied Physics, Vol. 47, No. 6 PART 1, 13.06.2008, p. 4799-4802.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Catalyst-free growth of high-quality ZnO nanorods on Si(100) substrate by two-step, off-axis pulsed-laser deposition
AU - Nishimura, Ryo
AU - Sakano, Tatsunori
AU - Okato, Takeshi
AU - Saiki, Toshiharu
AU - Obara, Minoru
PY - 2008/6/13
Y1 - 2008/6/13
N2 - We demonstrate the growth of ZnO nanorods on a Si(100) substrate through a two-step process, annealing and off-axis pulsed laser deposition (PLD), without a catalyst. ZnO powder was first dispersed on the Si substrate, and annealed to form seeds for ZnO nanorod growth for 2.5 h. In the second step, ZnO was deposited on the seeds by PLD for 1 h. It was experimentally confirmed that the surface morphology after annealing acts as growth nuclei of nanorods. Controlling growth parameters during deposition enables the adjustment of the sizes of nanorods, namely, diameter and length. The diameters of the grown nanorods are 50-700nm and the lengths are 2-10μm. Cathode luminescence (CL) spectra were used to evaluate the states of defects within the ZnO nanorods. According to the CL measurement results, the thinnest nanorod arrays were found to have fewer detects, and more detects were introduced as nanorods became thicker.
AB - We demonstrate the growth of ZnO nanorods on a Si(100) substrate through a two-step process, annealing and off-axis pulsed laser deposition (PLD), without a catalyst. ZnO powder was first dispersed on the Si substrate, and annealed to form seeds for ZnO nanorod growth for 2.5 h. In the second step, ZnO was deposited on the seeds by PLD for 1 h. It was experimentally confirmed that the surface morphology after annealing acts as growth nuclei of nanorods. Controlling growth parameters during deposition enables the adjustment of the sizes of nanorods, namely, diameter and length. The diameters of the grown nanorods are 50-700nm and the lengths are 2-10μm. Cathode luminescence (CL) spectra were used to evaluate the states of defects within the ZnO nanorods. According to the CL measurement results, the thinnest nanorod arrays were found to have fewer detects, and more detects were introduced as nanorods became thicker.
KW - Annealing
KW - Catalyst-free
KW - Nanorod
KW - Off-axis pulsed-laser deposition
KW - Zinc oxide
UR - http://www.scopus.com/inward/record.url?scp=55049140571&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=55049140571&partnerID=8YFLogxK
U2 - 10.1143/JJAP.47.4799
DO - 10.1143/JJAP.47.4799
M3 - Article
AN - SCOPUS:55049140571
VL - 47
SP - 4799
EP - 4802
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 6 PART 1
ER -