Chemical interaction between nitrogen and iron in silica glasses via sequential ion-implantation

Tetsuhiko Isobe, Tamotsu Toriyama, Robert A. Weeks, Raymond A. Zuhr

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Silica glass plates (Corning 7940 excimer grade) were implanted sequentially with N+ at 52 keV to different doses, ranging from 0 to 1.2 × 1017 ions cm-2, and then with Fe+ at 160 keV to 6 × 1016 ions cm-2 at room temperature and 4 μA cm-2. The intensity of ferromagnetic magnetic resonance (FMR) absorption and the magnetization calculated by the angular dependence of the FMR field reach maxima at an N/Fe atomic ratio ∼0.2. Two peaks due to Fe 2p3/2 electron are observed at 707.2 ± 0.2 and 710.9 ± 0.2 eV in the x-ray photoelectron spectra. The intensity of the former relative to the latter decreases with increasing the N dose. The conversion electron Mössbauer spectrum reveals the formation of superparamagnetic iron nitride as well as the existence of Fe2+ and Fe3+ in silica when implanting N+ to 7.5 × 1015 ions cm-2 and then 57Fe+ to 6 X 1016 ions cm-2 at N/Fe = 0.125. These results suggest that sequential ion-implantation of N+ and Fe+ produces iron nitride in silica glasses.

Original languageEnglish
Pages (from-to)2144-2150
Number of pages7
JournalJournal of Materials Research
Issue number8
Publication statusPublished - 1998 Aug

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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