Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition

Masayuki Kamei, Takahira Miyagi, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki, Tetsuya Sato

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5 Citations (Scopus)


Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.

Original languageEnglish
Pages (from-to)7025-7028
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number11
Publication statusPublished - 2003 Nov 1



  • CVD
  • Epitaxy
  • Rutherford backscattering spectroscopy
  • Sputtering
  • Titanium oxide

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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