Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition

Masayuki Kamei, Takahira Miyagi, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki, Tetsuya Sato

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.

Original languageEnglish
Pages (from-to)7025-7028
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number11
Publication statusPublished - 2003 Nov

Fingerprint

Epitaxial films
Metallorganic chemical vapor deposition
anatase
Magnetron sputtering
Titanium dioxide
metalorganic chemical vapor deposition
magnetron sputtering
Thin films
thin films
direct current
Lattice constants
Photoluminescence
photoluminescence
Dislocations (crystals)
Excitons
trapping
excitons
Crystalline materials
Substrates
profiles

Keywords

  • CVD
  • Epitaxy
  • Rutherford backscattering spectroscopy
  • Sputtering
  • Titanium oxide

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition. / Kamei, Masayuki; Miyagi, Takahira; Ogawa, Tomoyuki; Mitsuhashi, Takefumi; Yamazaki, Atsushi; Sato, Tetsuya.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 42, No. 11, 11.2003, p. 7025-7028.

Research output: Contribution to journalArticle

@article{4808b0765c1d4f4d902d17ea5eddd562,
title = "Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition",
abstract = "Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.",
keywords = "CVD, Epitaxy, Rutherford backscattering spectroscopy, Sputtering, Titanium oxide",
author = "Masayuki Kamei and Takahira Miyagi and Tomoyuki Ogawa and Takefumi Mitsuhashi and Atsushi Yamazaki and Tetsuya Sato",
year = "2003",
month = "11",
language = "English",
volume = "42",
pages = "7025--7028",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "11",

}

TY - JOUR

T1 - Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition

AU - Kamei, Masayuki

AU - Miyagi, Takahira

AU - Ogawa, Tomoyuki

AU - Mitsuhashi, Takefumi

AU - Yamazaki, Atsushi

AU - Sato, Tetsuya

PY - 2003/11

Y1 - 2003/11

N2 - Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.

AB - Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.

KW - CVD

KW - Epitaxy

KW - Rutherford backscattering spectroscopy

KW - Sputtering

KW - Titanium oxide

UR - http://www.scopus.com/inward/record.url?scp=1642577038&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=1642577038&partnerID=8YFLogxK

M3 - Article

VL - 42

SP - 7025

EP - 7028

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 11

ER -