Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition

Masayuki Kamei, Takahira Miyagi, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki, Tetsuya Sato

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.

Original languageEnglish
Pages (from-to)7025-7028
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number11
Publication statusPublished - 2003 Nov 1

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Keywords

  • CVD
  • Epitaxy
  • Rutherford backscattering spectroscopy
  • Sputtering
  • Titanium oxide

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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