Comparison of Micro Chrome Patterns in Gray Scale Lithography

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

Gray scale lithography is an attracting technology to fabricate 3D structures such as a microlens, prism etc. In this study, a gray scale chrome mask was fabricated by using image-processing software and E-beam lithography system that can use bitmap as drawing data. Random dither pattern and half-tone pattern by circles were generated as a fundamental micro pattern. UV exposure was performed on 10μm thick positive resist (AZ-p4620). The mask was distanced 80μm from the resist surface to defocus the micro pattern. As a result, half-tone pattern provides smooth surface while the surface condition of dither pattern had a horizontally large roughness. The resist depth was changed in the range of 20%-80% gray-scale value for the dither pattern, and in the little wider range of 20%-90% for the half-tone pattern. Then, Fresnel lens profile was formed by using half-tone pattern, which profile was calculated by C-code program and polar-coordinates conversion by image-processing software.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsM.A. Maher, J.F. Jakubczak
Pages221-228
Number of pages8
Volume5342
DOIs
Publication statusPublished - 2004
EventMicromachining and Microfabrication Process Technology IX - San Jose, CA., United States
Duration: 2004 Jan 272004 Jan 29

Other

OtherMicromachining and Microfabrication Process Technology IX
CountryUnited States
CitySan Jose, CA.
Period04/1/2704/1/29

Fingerprint

gray scale
Lithography
chromium
lithography
Masks
Image processing
dithers
Prisms
Lenses
Surface roughness
image processing
masks
computer programs
Fresnel lenses
polar coordinates
profiles
prisms
roughness

Keywords

  • Chrome mask
  • Gray scale
  • Half-tone
  • Image processing
  • Lithography
  • Random dither

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Hanai, K., & Matsumoto, Y. (2004). Comparison of Micro Chrome Patterns in Gray Scale Lithography. In M. A. Maher, & J. F. Jakubczak (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 5342, pp. 221-228) https://doi.org/10.1117/12.525019

Comparison of Micro Chrome Patterns in Gray Scale Lithography. / Hanai, Kei; Matsumoto, Yoshinori.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / M.A. Maher; J.F. Jakubczak. Vol. 5342 2004. p. 221-228.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Hanai, K & Matsumoto, Y 2004, Comparison of Micro Chrome Patterns in Gray Scale Lithography. in MA Maher & JF Jakubczak (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 5342, pp. 221-228, Micromachining and Microfabrication Process Technology IX, San Jose, CA., United States, 04/1/27. https://doi.org/10.1117/12.525019
Hanai K, Matsumoto Y. Comparison of Micro Chrome Patterns in Gray Scale Lithography. In Maher MA, Jakubczak JF, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 5342. 2004. p. 221-228 https://doi.org/10.1117/12.525019
Hanai, Kei ; Matsumoto, Yoshinori. / Comparison of Micro Chrome Patterns in Gray Scale Lithography. Proceedings of SPIE - The International Society for Optical Engineering. editor / M.A. Maher ; J.F. Jakubczak. Vol. 5342 2004. pp. 221-228
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