Comparison of Micro Chrome Patterns in Gray Scale Lithography

Research output: Contribution to journalConference article

6 Citations (Scopus)

Abstract

Gray scale lithography is an attracting technology to fabricate 3D structures such as a microlens, prism etc. In this study, a gray scale chrome mask was fabricated by using image-processing software and E-beam lithography system that can use bitmap as drawing data. Random dither pattern and half-tone pattern by circles were generated as a fundamental micro pattern. UV exposure was performed on 10μm thick positive resist (AZ-p4620). The mask was distanced 80μm from the resist surface to defocus the micro pattern. As a result, half-tone pattern provides smooth surface while the surface condition of dither pattern had a horizontally large roughness. The resist depth was changed in the range of 20%-80% gray-scale value for the dither pattern, and in the little wider range of 20%-90% for the half-tone pattern. Then, Fresnel lens profile was formed by using half-tone pattern, which profile was calculated by C-code program and polar-coordinates conversion by image-processing software.

Original languageEnglish
Pages (from-to)221-228
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5342
DOIs
Publication statusPublished - 2004 May 10
EventMicromachining and Microfabrication Process Technology IX - San Jose, CA., United States
Duration: 2004 Jan 272004 Jan 29

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Keywords

  • Chrome mask
  • Gray scale
  • Half-tone
  • Image processing
  • Lithography
  • Random dither

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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