Comparison of tool feed influence in CNC polishing between a novel Circular-random path and other pseudo-random paths

Ken Takizawa; Anthony Beaucamp

doi:10.1364/OE.25.022411

Comparison of tool feed influence in CNC polishing between a novel Circular-random path and other pseudo-random paths

Ken Takizawa, Anthony Beaucamp

Research output: Contribution to journal › Article › peer-review

Abstract

A new category of circular pseudo-random paths is proposed in order to suppress repetitive patterns and improve surface waviness on ultra-precision polished surfaces. Random paths in prior research had many corners, therefore deceleration of the polishing tool affected the surface waviness. The new random path can suppress velocity changes of the polishing tool and thus restrict degradation of the surface waviness, making it suitable for applications with stringent mid-spatial-frequency requirements such as photomask blanks for EUV lithography.

Original language	English
Pages (from-to)	22411-22424
Number of pages	14
Journal	Optics Express
Volume	25
Issue number	19
DOIs	https://doi.org/10.1364/OE.25.022411
Publication status	Published - 2017 Sept 18
Externally published	Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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abstract = "A new category of circular pseudo-random paths is proposed in order to suppress repetitive patterns and improve surface waviness on ultra-precision polished surfaces. Random paths in prior research had many corners, therefore deceleration of the polishing tool affected the surface waviness. The new random path can suppress velocity changes of the polishing tool and thus restrict degradation of the surface waviness, making it suitable for applications with stringent mid-spatial-frequency requirements such as photomask blanks for EUV lithography.",

author = "Ken Takizawa and Anthony Beaucamp",

note = "Publisher Copyright: {\textcopyright} 2017 Optical Society of America.",

year = "2017",

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AB - A new category of circular pseudo-random paths is proposed in order to suppress repetitive patterns and improve surface waviness on ultra-precision polished surfaces. Random paths in prior research had many corners, therefore deceleration of the polishing tool affected the surface waviness. The new random path can suppress velocity changes of the polishing tool and thus restrict degradation of the surface waviness, making it suitable for applications with stringent mid-spatial-frequency requirements such as photomask blanks for EUV lithography.

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Comparison of tool feed influence in CNC polishing between a novel Circular-random path and other pseudo-random paths

Abstract

ASJC Scopus subject areas

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