Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration

Young Tae Lee, Hee Don Seo, Akihisa Kawamura, Tetsuhiro Yamada, Yoshinori Matsumoto, Makoto Ishida, Tetsuro Nakamura

Research output: Contribution to conferencePaper

15 Citations (Scopus)

Abstract

In order to reduce the offset and its temperature drift of the piezoresistive pressure sensor by the different properties of the piezoresistors and the residual stress, a double Wheatstone-bridge pressure sensor was studied. Because a compensation bridge was arranged near by the pressure sensitive bridge, which have the similar offset components, reduction of the offset and its temperature drift was realized by the subtraction of the output of the two bridges. By this compensation method, the offset and its temperature drift were reduced more than 95%, respectively. The sensitivity of the fabricated pressure sensor was 11.7 mV/V kgf cm-2 for 0.9 kgf cm-2 full-scale pressure range.

Original languageEnglish
Pages570-573
Number of pages4
Publication statusPublished - 1995 Dec 1
Externally publishedYes
EventProceedings of the 1995 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Part 1 (of 2) - Stockholm, Sweden
Duration: 1995 Jun 251995 Jun 29

Other

OtherProceedings of the 1995 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Part 1 (of 2)
CityStockholm, Sweden
Period95/6/2595/6/29

ASJC Scopus subject areas

  • Engineering(all)

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    Lee, Y. T., Seo, H. D., Kawamura, A., Yamada, T., Matsumoto, Y., Ishida, M., & Nakamura, T. (1995). Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration. 570-573. Paper presented at Proceedings of the 1995 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Part 1 (of 2), Stockholm, Sweden, .