Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration

Young Tae Lee, Hee Don Seo, Akihisa Kawamura, Tetsuhiro Yamada, Yoshinori Matsumoto, Makoto Ishida, Tetsuro Nakamura

Research output: Chapter in Book/Report/Conference proceedingConference contribution

15 Citations (Scopus)

Abstract

In order to reduce the offset and its temperature drift of the piezoresistive pressure sensor by the different properties of the piezoresistors and the residual stress, a double Wheatstone-bridge pressure sensor was studied. Because a compensation bridge was arranged near by the pressure sensitive bridge, which have the similar offset components, reduction of the offset and its temperature drift was realized by the subtraction of the output of the two bridges. By this compensation method, the offset and its temperature drift were reduced more than 95%, respectively. The sensitivity of the fabricated pressure sensor was 11.7 mV/V kgf cm-2 for 0.9 kgf cm-2 full-scale pressure range.

Original languageEnglish
Title of host publicationInternational Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings
PublisherIEEE
Pages570-573
Number of pages4
Volume2
Publication statusPublished - 1995
Externally publishedYes
EventProceedings of the 1995 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Part 1 (of 2) - Stockholm, Sweden
Duration: 1995 Jun 251995 Jun 29

Other

OtherProceedings of the 1995 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Part 1 (of 2)
CityStockholm, Sweden
Period95/6/2595/6/29

Fingerprint

Silicon sensors
Pressure sensors
Temperature
Residual stresses
Compensation and Redress

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Lee, Y. T., Seo, H. D., Kawamura, A., Yamada, T., Matsumoto, Y., Ishida, M., & Nakamura, T. (1995). Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration. In International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings (Vol. 2, pp. 570-573). IEEE.

Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration. / Lee, Young Tae; Seo, Hee Don; Kawamura, Akihisa; Yamada, Tetsuhiro; Matsumoto, Yoshinori; Ishida, Makoto; Nakamura, Tetsuro.

International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings. Vol. 2 IEEE, 1995. p. 570-573.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Lee, YT, Seo, HD, Kawamura, A, Yamada, T, Matsumoto, Y, Ishida, M & Nakamura, T 1995, Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration. in International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings. vol. 2, IEEE, pp. 570-573, Proceedings of the 1995 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Part 1 (of 2), Stockholm, Sweden, 95/6/25.
Lee YT, Seo HD, Kawamura A, Yamada T, Matsumoto Y, Ishida M et al. Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration. In International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings. Vol. 2. IEEE. 1995. p. 570-573
Lee, Young Tae ; Seo, Hee Don ; Kawamura, Akihisa ; Yamada, Tetsuhiro ; Matsumoto, Yoshinori ; Ishida, Makoto ; Nakamura, Tetsuro. / Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration. International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings. Vol. 2 IEEE, 1995. pp. 570-573
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AU - Ishida, Makoto

AU - Nakamura, Tetsuro

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