Control on wetting properties of spin-deposited silica films by surface silylation method

A. Venkateswara Rao, Sanjay S. Latthe, Sunetra L. Dhere, Swapnali S. Pawar, Hiroaki Imai, V. Ganesan, Satish C. Gupta, Pratap B. Wagh

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

Control on the wettability of solid materials by liquid is a classical and key issue in surface engineering. Optically transparent water-repellent silica films have been spin-deposited on glass substrates at room temperature (∼27 °C). The wetting behavior of silica films was controlled by surface silylation method using dimethylchlorosilane (DMCS) as a silylating reagent. A coating sol was prepared by keeping the molar ratio of methyltrimethoxysilane (MTMS) precursor, methanol (MeOH) solvent, water (H 2 O) constant at 1:8.8:2.64 respectively, with 4 M NH 4 OH as a catalyst throughout the experiments and the amount of DMCS in hexane was varied from 0 to 12 vol.%. It was found that with an increase in vol.% of DMCS, the water contact angle values of the films increased from 78° to 136°. At 12 vol.% of DMCS, the film shows static water contact angle as high as 136° and water sliding angle as low as 18°. The hydrophobic silica films retained their water repellency up to a temperature 295 °C and above this temperature the films show superhydrophilic behavior. These results are compared with our earlier research work done on silylation of silica surface using hexamethyldisilazane (HMDZ) and trimethylchlorosilane (TMCS). The hydrophobic silica films were characterized by taking into consideration the Fourier transform infrared (FT-IR) spectroscopy, thermo gravimetric-differential thermal (TG-DT) analyses, scanning electron microscopy (SEM), atomic force microscopy (AFM), % of optical transmission, thermal and chemical aging tests, humidity tests, static and dynamic water contact angle measurements.

Original languageEnglish
Pages (from-to)2115-2121
Number of pages7
JournalApplied Surface Science
Volume256
Issue number7
DOIs
Publication statusPublished - 2010 Jan 15

Keywords

  • Coatings
  • Humidity
  • Hydrophobic
  • Sol-gel process
  • Transparent
  • Wetting

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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  • Cite this

    Rao, A. V., Latthe, S. S., Dhere, S. L., Pawar, S. S., Imai, H., Ganesan, V., Gupta, S. C., & Wagh, P. B. (2010). Control on wetting properties of spin-deposited silica films by surface silylation method. Applied Surface Science, 256(7), 2115-2121. https://doi.org/10.1016/j.apsusc.2009.09.057