Damage-free top-down processes for fabricating two-dimensional arrays of 7nm GaAs nanodiscs using bio-templates and neutral beam etching

Xuan Yu Wang, Chi Hsien Huang, Rikako Tsukamoto, Pierre Andre Mortemousque, Kohei M. Itoh, Yuzo Ohno, Seiji Samukawa

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

The first damage-free top-down fabrication processes for a two-dimensional array of 7nm GaAs nanodiscs was developed by using ferritin (a protein which includes a 7nm diameter iron core) bio-templates and neutral beam etching. The photoluminescence of GaAs etched with a neutral beam clearly revealed that the processes could accomplish defect-free etching for GaAs. In the bio-template process, to remove the ferritin protein shell without thermal damage to the GaAs, we firstly developed an oxygen-radical treatment method with a low temperature of 280 °C. Then, the neutral beam etched the defect-free nanodisc structure of the GaAs using the iron core as an etching mask. As a result, a two-dimensional array of GaAs quantum dots with a diameter of ∼ 7nm, a height of ∼ 10nm, a high taper angle of 88° and a quantum dot density of more than 7 × 1011cm- 2 was successfully fabricated without causing any damage to the GaAs.

Original languageEnglish
Article number365301
JournalNanotechnology
Volume22
Issue number36
DOIs
Publication statusPublished - 2011 Sep 7

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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