Deionization of Dopants in Silicon Nanofilms even with Donor Concentration of Greater than 1019 cm-3

Takahisa Tanaka, Yuya Kurosawa, Naotoshi Kadotani, Tsunaki Takahashi, Shunri Oda, Ken Uchida

    Research output: Contribution to journalArticlepeer-review

    3 Citations (Scopus)


    Understanding the dopant properties in heavily doped nanoscale semiconductors is essential to design nanoscale devices. We report the deionization or finite ionization energy of dopants in silicon (Si) nanofilms with dopant concentration (ND) of greater than 1019 cm-3, which is in contrast to the zero ionization energy (ED) in bulk Si at the same ND. From the comparison of experimentally observed and theoretically calculated ED, we attribute the deionization to the suppression of metal-insulator transition in highly doped nanoscale semiconductors in addition to the quantum confinement and the dielectric mismatch, which greatly increase ED in low-doped nanoscale semiconductors. Thus, for nanoscale transistors, ND should be higher than that estimated from bulk Si dopant properties in order to reduce their resistivity by the metal-insulator transition.

    Original languageEnglish
    Pages (from-to)1143-1149
    Number of pages7
    JournalNano Letters
    Issue number2
    Publication statusPublished - 2016 Feb 10


    • Ionization energy
    • metal-insulator transition
    • nanostructure
    • phosphorus
    • silicon
    • transistor

    ASJC Scopus subject areas

    • Bioengineering
    • Chemistry(all)
    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanical Engineering


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