Demonstration of 1000-times switching of phase-change optical gate with Si wire waveguides

D. Tanaka, Y. Ikuma, Y. Shoji, M. Kuwahara, X. Wang, K. Kintaka, H. Kawashima, T. Toyosaki, H. Tsuda

    Research output: Contribution to journalArticle

    11 Citations (Scopus)

    Abstract

    1000-times stable switching operation of an optical gate incorporating a Ge2Sb2Te5 thin film with Si wire waveguides is reported. The phase of the Ge2Sb2Te5 was reversibly changed from the amorphous state to the crystalline state by the application of pulsed laser irradiation. The extinction ratio was 9.7dB on average, and did not decline throughout the entire sequence of 1000 switching events induced by irradiation. The wavelengths of the signal light and of the laser pulses were 1550nm and 660nm, respectively.

    Original languageEnglish
    Pages (from-to)268-269
    Number of pages2
    JournalElectronics Letters
    Volume47
    Issue number4
    DOIs
    Publication statusPublished - 2011 Feb 17

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering

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  • Cite this

    Tanaka, D., Ikuma, Y., Shoji, Y., Kuwahara, M., Wang, X., Kintaka, K., Kawashima, H., Toyosaki, T., & Tsuda, H. (2011). Demonstration of 1000-times switching of phase-change optical gate with Si wire waveguides. Electronics Letters, 47(4), 268-269. https://doi.org/10.1049/el.2010.3705