Densification of SiO2 gel films by synchrotron radiation and its dependence on photon energy

Hiroaki Imai, Koichi Awazu, Masaru Yasumori, Hiroshi Hirashima, Hideo Onuki

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

The interaction of synchrotron radiation (SR) emitted from a polarizing undulator with SiO2 gel films was investigated by elipsometry and infrared spectroscopy. The photon energy in SR was varied in the range of 6.4-17.8 eV using an Onuki-type undulator in order to study the energy dependence of the interaction. We found that an increase of refractive index, a decrease of thickness of the films and a loss of OH groups were induced by photons with energies above approx.9 eV although any changes were not observed with photons below approx.7 eV. These results suggest that SiO2 gel films are densified through electronic processes stimulated by the energetic photons.

Original languageEnglish
Pages (from-to)39-43
Number of pages5
JournalMaterials Research Society Symposium - Proceedings
Volume375
Publication statusPublished - 1995 Jan 1
EventProceedings of the 1994 MRS Fall Meeting - Boston, MA, USA
Duration: 1994 Nov 271994 Dec 2

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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