Dependence of driving frequency on capacitively coupled plasma in CF4

Sumie Segawa, Masaru Kurihara, Nobuhiko Nakano, Toshiaki Makabe

Research output: Contribution to journalArticlepeer-review

36 Citations (Scopus)


A radio-frequency CF4 plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation continuum model. The discharge with negative ions has the double layer similar in appearance to O2; the structure and mechanism are markedly changed as a function of driving frequency. The effect of driving frequency is numerically studied between 13.56 MHz and 200 MHz for 200 mTorr and 50 mTorr. In these studies, the plasma density is kept constant at approx. 1011 cm-3, considering the charged species CF3+, CF2+, CF+, C+, F+, F-, and electrons. The mean energy of charged particles is also discussed.

Original languageEnglish
Pages (from-to)4416-4422
Number of pages7
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number7 B
Publication statusPublished - 1999 Jul

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


Dive into the research topics of 'Dependence of driving frequency on capacitively coupled plasma in CF4'. Together they form a unique fingerprint.

Cite this