Dependence of driving frequency on capacitively coupled plasma in CF4

Sumie Segawa; Masaru Kurihara; Nobuhiko Nakano; Toshiaki Makabe

doi:10.1143/jjap.38.4416

Dependence of driving frequency on capacitively coupled plasma in CF₄

Sumie Segawa, Masaru Kurihara, Nobuhiko Nakano, Toshiaki Makabe

Department of Electronics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

36 Citations (Scopus)

Abstract

A radio-frequency CF₄ plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation continuum model. The discharge with negative ions has the double layer similar in appearance to O₂; the structure and mechanism are markedly changed as a function of driving frequency. The effect of driving frequency is numerically studied between 13.56 MHz and 200 MHz for 200 mTorr and 50 mTorr. In these studies, the plasma density is kept constant at approx. 10¹¹ cm^-3, considering the charged species CF₃⁺, CF₂⁺, CF⁺, C⁺, F⁺, F^-, and electrons. The mean energy of charged particles is also discussed.

Original language	English
Pages (from-to)	4416-4422
Number of pages	7
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	38
Issue number	7 B
DOIs	https://doi.org/10.1143/jjap.38.4416
Publication status	Published - 1999 Jul

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/jjap.38.4416

Cite this

@article{54f12c4f3393479693fb1269a413df41,

title = "Dependence of driving frequency on capacitively coupled plasma in CF4",

abstract = "A radio-frequency CF4 plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation continuum model. The discharge with negative ions has the double layer similar in appearance to O2; the structure and mechanism are markedly changed as a function of driving frequency. The effect of driving frequency is numerically studied between 13.56 MHz and 200 MHz for 200 mTorr and 50 mTorr. In these studies, the plasma density is kept constant at approx. 1011 cm-3, considering the charged species CF3+, CF2+, CF+, C+, F+, F-, and electrons. The mean energy of charged particles is also discussed.",

author = "Sumie Segawa and Masaru Kurihara and Nobuhiko Nakano and Toshiaki Makabe",

year = "1999",

month = jul,

doi = "10.1143/jjap.38.4416",

language = "English",

volume = "38",

pages = "4416--4422",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "7 B",

}

TY - JOUR

T1 - Dependence of driving frequency on capacitively coupled plasma in CF4

AU - Segawa, Sumie

AU - Kurihara, Masaru

AU - Nakano, Nobuhiko

AU - Makabe, Toshiaki

PY - 1999/7

Y1 - 1999/7

N2 - A radio-frequency CF4 plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation continuum model. The discharge with negative ions has the double layer similar in appearance to O2; the structure and mechanism are markedly changed as a function of driving frequency. The effect of driving frequency is numerically studied between 13.56 MHz and 200 MHz for 200 mTorr and 50 mTorr. In these studies, the plasma density is kept constant at approx. 1011 cm-3, considering the charged species CF3+, CF2+, CF+, C+, F+, F-, and electrons. The mean energy of charged particles is also discussed.

AB - A radio-frequency CF4 plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation continuum model. The discharge with negative ions has the double layer similar in appearance to O2; the structure and mechanism are markedly changed as a function of driving frequency. The effect of driving frequency is numerically studied between 13.56 MHz and 200 MHz for 200 mTorr and 50 mTorr. In these studies, the plasma density is kept constant at approx. 1011 cm-3, considering the charged species CF3+, CF2+, CF+, C+, F+, F-, and electrons. The mean energy of charged particles is also discussed.

UR - http://www.scopus.com/inward/record.url?scp=0033157678&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033157678&partnerID=8YFLogxK

U2 - 10.1143/jjap.38.4416

DO - 10.1143/jjap.38.4416

M3 - Article

AN - SCOPUS:0033157678

SN - 0021-4922

VL - 38

SP - 4416

EP - 4422

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 7 B

ER -

Dependence of driving frequency on capacitively coupled plasma in CF₄

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this