Deposition of fluoropolymer thin films by vacuum-ultraviolet laser ablation

Y. Ueno, T. Fujii, S. Inoue, F. Kannari

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    The paper studies the production of polytefrafluoroethylene (PTFE) thin films by laser ablation using an F2 laser at 157 nm where PTFE exhibits a highest absorption. The thin film deposition was carried out in an Ar atmosphere of approx.200 mTorr.

    Original languageEnglish
    Title of host publicationConference Proceedings - Lasers and Electro-Optics Society Annual Meeting
    PublisherPubl by IEEE
    Pages211-212
    Number of pages2
    ISBN (Print)0780319710
    Publication statusPublished - 1994 Jan 1
    EventProceedings of the Conference on Lasers and Electro-Optics - Anaheim, CA, USA
    Duration: 1994 May 81994 May 13

    Publication series

    NameConference Proceedings - Lasers and Electro-Optics Society Annual Meeting
    Volume8

    Other

    OtherProceedings of the Conference on Lasers and Electro-Optics
    CityAnaheim, CA, USA
    Period94/5/894/5/13

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Electrical and Electronic Engineering

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  • Cite this

    Ueno, Y., Fujii, T., Inoue, S., & Kannari, F. (1994). Deposition of fluoropolymer thin films by vacuum-ultraviolet laser ablation. In Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting (pp. 211-212). (Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting; Vol. 8). Publ by IEEE.