Deposition of Through-Hole Metal Film on Glass with Electroless Plating

Fumio Nakamaru, Yoshinori Matsumoto

Research output: Contribution to journalArticle

Abstract

Good adhesive nickel film was deposited on a glass substrate with electroless nickel plating and photolithography technique. Line-and-space metal patterns were deposited on the glass substrate and the resolution was approximately 20|m. Through holes on a 500|m-thickness glass substrate were fabricated by sandblast method, and the holes were metalized by using dry-film and the plating. Connection yield was 100% in 4cm2 glass substrate, and the resistance of the through-hole was less than 0.05Ω. Keywords : glass substrate, electorless plating, adherence, through hole, photolithography.

Original languageEnglish
Pages (from-to)313-314
Number of pages2
JournalIEEJ Transactions on Sensors and Micromachines
Volume123
Issue number8
DOIs
Publication statusPublished - 2003

Keywords

  • adherence
  • electorless plating
  • glass substrate
  • photolithography
  • through hole

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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