Design and the fabrication of a multi-level phase hologram using subwavelength-scale hole array structures

Takehiro Komada, Masaya Ogawa, Masakatsu Hakamata, Hiroyuki Tsuda, Nobuaki Kitano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The three-level phase hologram with 128 × 128 pixels of 10-??m square, 500-nm pitch hole array structures is fabricated. The clear diffracted image is generated for the light with a wavelength of 780 nm.

Original languageEnglish
Title of host publicationFrontiers in Optics, FiO 2005
PublisherOptical Society of America
ISBN (Print)1557527970, 9781557527974
Publication statusPublished - 2005 Jan 1
EventFrontiers in Optics, FiO 2005 - Tucson, AZ, United States
Duration: 2005 Oct 162005 Oct 21

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherFrontiers in Optics, FiO 2005
CountryUnited States
CityTucson, AZ
Period05/10/1605/10/21

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ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Komada, T., Ogawa, M., Hakamata, M., Tsuda, H., & Kitano, N. (2005). Design and the fabrication of a multi-level phase hologram using subwavelength-scale hole array structures. In Frontiers in Optics, FiO 2005 (Optics InfoBase Conference Papers). Optical Society of America.