Development of cluster ion source based on modulated pulse power magnetron sputtering technique

C. H. Zhang; H. Tsunoyama; H. Akatsuka; H. Sekiya; T. Nagase; A. Nakajima

doi:10.1109/NEMS.2013.6559764

Development of cluster ion source based on modulated pulse power magnetron sputtering technique

C. H. Zhang, H. Tsunoyama, H. Akatsuka, H. Sekiya, T. Nagase, A. Nakajima

Department of Chemistry

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A new ion source based on modulated pulse power (MPP) magnetron sputtering (MSP) was developed and demonstrated for cluster production. By employing MPP-MSP, both silver and silicon cluster beams were produced and analyzed by a quadrupole mass spectrometer. It is found that the maximum intensity of silver cluster anions reaches 500 pA, which is considerably higher than that with a conventional DC-MSP. For silicon cluster cation, the overall ion intensity of the cluster beam by MPP-MSP is about three times higher than that generated by DC-MSP.

Original language	English
Title of host publication	8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
Pages	428-431
Number of pages	4
DOIs	https://doi.org/10.1109/NEMS.2013.6559764
Publication status	Published - 2013 Sept 2
Event	8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013 - Suzhou, China Duration: 2013 Apr 7 → 2013 Apr 10

Publication series

Name	8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013

Other

Other	8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
Country/Territory	China
City	Suzhou
Period	13/4/7 → 13/4/10

Keywords

cluster source
high power impulse magnetron sputtering
mass spectroscopy
modulated pulse power

ASJC Scopus subject areas

Biochemistry, Genetics and Molecular Biology (miscellaneous)
Biotechnology

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10.1109/NEMS.2013.6559764

Cite this

Zhang, C. H., Tsunoyama, H., Akatsuka, H., Sekiya, H., Nagase, T., & Nakajima, A. (2013). Development of cluster ion source based on modulated pulse power magnetron sputtering technique. In 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013 (pp. 428-431). [6559764] (8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013). https://doi.org/10.1109/NEMS.2013.6559764

Development of cluster ion source based on modulated pulse power magnetron sputtering technique. / Zhang, C. H.; Tsunoyama, H.; Akatsuka, H. et al.

8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013. 2013. p. 428-431 6559764 (8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Zhang, CH, Tsunoyama, H, Akatsuka, H, Sekiya, H, Nagase, T & Nakajima, A 2013, Development of cluster ion source based on modulated pulse power magnetron sputtering technique. in 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013., 6559764, 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013, pp. 428-431, 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013, Suzhou, China, 13/4/7. https://doi.org/10.1109/NEMS.2013.6559764

Zhang CH, Tsunoyama H, Akatsuka H, Sekiya H, Nagase T, Nakajima A. Development of cluster ion source based on modulated pulse power magnetron sputtering technique. In 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013. 2013. p. 428-431. 6559764. (8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013). doi: 10.1109/NEMS.2013.6559764

Zhang, C. H. ; Tsunoyama, H. ; Akatsuka, H. et al. / Development of cluster ion source based on modulated pulse power magnetron sputtering technique. 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013. 2013. pp. 428-431 (8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013).

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title = "Development of cluster ion source based on modulated pulse power magnetron sputtering technique",

abstract = "A new ion source based on modulated pulse power (MPP) magnetron sputtering (MSP) was developed and demonstrated for cluster production. By employing MPP-MSP, both silver and silicon cluster beams were produced and analyzed by a quadrupole mass spectrometer. It is found that the maximum intensity of silver cluster anions reaches 500 pA, which is considerably higher than that with a conventional DC-MSP. For silicon cluster cation, the overall ion intensity of the cluster beam by MPP-MSP is about three times higher than that generated by DC-MSP.",

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author = "Zhang, {C. H.} and H. Tsunoyama and H. Akatsuka and H. Sekiya and T. Nagase and A. Nakajima",

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AU - Zhang, C. H.

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AU - Nagase, T.

AU - Nakajima, A.

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AB - A new ion source based on modulated pulse power (MPP) magnetron sputtering (MSP) was developed and demonstrated for cluster production. By employing MPP-MSP, both silver and silicon cluster beams were produced and analyzed by a quadrupole mass spectrometer. It is found that the maximum intensity of silver cluster anions reaches 500 pA, which is considerably higher than that with a conventional DC-MSP. For silicon cluster cation, the overall ion intensity of the cluster beam by MPP-MSP is about three times higher than that generated by DC-MSP.

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KW - high power impulse magnetron sputtering

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KW - modulated pulse power

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Development of cluster ion source based on modulated pulse power magnetron sputtering technique

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