Development of cluster ion source based on modulated pulse power magnetron sputtering technique

C. H. Zhang, Hironori Tsunoyama, H. Akatsuka, H. Sekiya, T. Nagase, Atsushi Nakajima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A new ion source based on modulated pulse power (MPP) magnetron sputtering (MSP) was developed and demonstrated for cluster production. By employing MPP-MSP, both silver and silicon cluster beams were produced and analyzed by a quadrupole mass spectrometer. It is found that the maximum intensity of silver cluster anions reaches 500 pA, which is considerably higher than that with a conventional DC-MSP. For silicon cluster cation, the overall ion intensity of the cluster beam by MPP-MSP is about three times higher than that generated by DC-MSP.

Original languageEnglish
Title of host publication8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
Pages428-431
Number of pages4
DOIs
Publication statusPublished - 2013
Event8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013 - Suzhou, China
Duration: 2013 Apr 72013 Apr 10

Other

Other8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
CountryChina
CitySuzhou
Period13/4/713/4/10

Fingerprint

Silicon
Ion sources
Silver
Magnetron sputtering
Ions
Anions
Cations
Mass spectrometers

Keywords

  • cluster source
  • high power impulse magnetron sputtering
  • mass spectroscopy
  • modulated pulse power

ASJC Scopus subject areas

  • Biochemistry, Genetics and Molecular Biology (miscellaneous)
  • Biotechnology

Cite this

Zhang, C. H., Tsunoyama, H., Akatsuka, H., Sekiya, H., Nagase, T., & Nakajima, A. (2013). Development of cluster ion source based on modulated pulse power magnetron sputtering technique. In 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013 (pp. 428-431). [6559764] https://doi.org/10.1109/NEMS.2013.6559764

Development of cluster ion source based on modulated pulse power magnetron sputtering technique. / Zhang, C. H.; Tsunoyama, Hironori; Akatsuka, H.; Sekiya, H.; Nagase, T.; Nakajima, Atsushi.

8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013. 2013. p. 428-431 6559764.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zhang, CH, Tsunoyama, H, Akatsuka, H, Sekiya, H, Nagase, T & Nakajima, A 2013, Development of cluster ion source based on modulated pulse power magnetron sputtering technique. in 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013., 6559764, pp. 428-431, 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013, Suzhou, China, 13/4/7. https://doi.org/10.1109/NEMS.2013.6559764
Zhang CH, Tsunoyama H, Akatsuka H, Sekiya H, Nagase T, Nakajima A. Development of cluster ion source based on modulated pulse power magnetron sputtering technique. In 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013. 2013. p. 428-431. 6559764 https://doi.org/10.1109/NEMS.2013.6559764
Zhang, C. H. ; Tsunoyama, Hironori ; Akatsuka, H. ; Sekiya, H. ; Nagase, T. ; Nakajima, Atsushi. / Development of cluster ion source based on modulated pulse power magnetron sputtering technique. 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013. 2013. pp. 428-431
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