Development of Exposure Method for Wiring Pattern on High Aspect Structures

Kei Hanai, Yoshiaki Tamura, Yoshinori Matsumoto

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A crystal oscillator needs to be wired on the both top and sidewalls in order to detect electrical charge. Photolithography is expected to fabricate finer pattern than mask evaporation. However, coating resist on an edge of the substrate and patterning the sidewall are difficult. In this study, photoresist (AZ-p4620) was successfully coated on all surfaces and edges of the substrate by spray coating. And resist on all surfaces was patterned by using inclined exposure method. A line pattern of 20pm width was obtained on the sidewall at 150µm depth.

Original languageEnglish
Pages (from-to)280-281
Number of pages2
JournalIEEJ Transactions on Sensors and Micromachines
Volume125
Issue number6
DOIs
Publication statusPublished - 2006

Fingerprint

Electric wiring
Crystal oscillators
Coatings
Photolithography
Substrates
Photoresists
Masks
Evaporation

Keywords

  • crystal oscillator
  • inclined exposure
  • photolithography
  • spray coating

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Development of Exposure Method for Wiring Pattern on High Aspect Structures. / Hanai, Kei; Tamura, Yoshiaki; Matsumoto, Yoshinori.

In: IEEJ Transactions on Sensors and Micromachines, Vol. 125, No. 6, 2006, p. 280-281.

Research output: Contribution to journalArticle

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