Development of Exposure Method for Wiring Pattern on High Aspect Structures

Kei Hanai; Yoshiaki Tamura; Yoshinori Matsumoto

doi:10.1541/ieejsmas.125.280

Development of Exposure Method for Wiring Pattern on High Aspect Structures

Kei Hanai, Yoshiaki Tamura, Yoshinori Matsumoto

Department of Applied Physics and Physico-Informatics

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A crystal oscillator needs to be wired on the both top and sidewalls in order to detect electrical charge. Photolithography is expected to fabricate finer pattern than mask evaporation. However, coating resist on an edge of the substrate and patterning the sidewall are difficult. In this study, photoresist (AZ-p4620) was successfully coated on all surfaces and edges of the substrate by spray coating. And resist on all surfaces was patterned by using inclined exposure method. A line pattern of 20pm width was obtained on the sidewall at 150µm depth.

Original language	English
Pages (from-to)	280-281
Number of pages	2
Journal	ieej transactions on sensors and micromachines
Volume	125
Issue number	6
DOIs	https://doi.org/10.1541/ieejsmas.125.280
Publication status	Published - 2006

Keywords

crystal oscillator
inclined exposure
photolithography
spray coating

ASJC Scopus subject areas

Mechanical Engineering
Electrical and Electronic Engineering

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10.1541/ieejsmas.125.280

Cite this

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abstract = "A crystal oscillator needs to be wired on the both top and sidewalls in order to detect electrical charge. Photolithography is expected to fabricate finer pattern than mask evaporation. However, coating resist on an edge of the substrate and patterning the sidewall are difficult. In this study, photoresist (AZ-p4620) was successfully coated on all surfaces and edges of the substrate by spray coating. And resist on all surfaces was patterned by using inclined exposure method. A line pattern of 20pm width was obtained on the sidewall at 150µm depth.",

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AU - Tamura, Yoshiaki

AU - Matsumoto, Yoshinori

PY - 2006

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N2 - A crystal oscillator needs to be wired on the both top and sidewalls in order to detect electrical charge. Photolithography is expected to fabricate finer pattern than mask evaporation. However, coating resist on an edge of the substrate and patterning the sidewall are difficult. In this study, photoresist (AZ-p4620) was successfully coated on all surfaces and edges of the substrate by spray coating. And resist on all surfaces was patterned by using inclined exposure method. A line pattern of 20pm width was obtained on the sidewall at 150µm depth.

AB - A crystal oscillator needs to be wired on the both top and sidewalls in order to detect electrical charge. Photolithography is expected to fabricate finer pattern than mask evaporation. However, coating resist on an edge of the substrate and patterning the sidewall are difficult. In this study, photoresist (AZ-p4620) was successfully coated on all surfaces and edges of the substrate by spray coating. And resist on all surfaces was patterned by using inclined exposure method. A line pattern of 20pm width was obtained on the sidewall at 150µm depth.

KW - crystal oscillator

KW - inclined exposure

KW - photolithography

KW - spray coating

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Development of Exposure Method for Wiring Pattern on High Aspect Structures

Abstract

Keywords

ASJC Scopus subject areas

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