Development of fixture element for vacuum transportation of silicon wafer using electro-rheological gel

Masayuki Tanaka, Yasuhiro Kakinuma, Tojiro Aoyama, Hidenobu Anzai, Takafumi Kawaguchi

Research output: Contribution to conferencePaperpeer-review

Abstract

Electro-rheological gel (ERG) is a functional material whose friction characteristic varies according to the intensity of an applied electric field. In this study, ERG is applied to the fixture element for a silicon wafer. Silicon wafers are used for semiconductor manufacturing, a process carried out in a vacuum. The purpose of this study is to clarify the basic characteristic of ERG in a vacuum. To investigate these characteristics, several tests were carried out using silicon wafers. In addition, the optimal shape of one-sided electrodes applying the electric field effectively was designed by means of a static electric field analysis.

Original languageEnglish
Publication statusPublished - 2007 Dec 1
Event4th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2007 - Fukuoka, Japan
Duration: 2007 Nov 72007 Nov 9

Other

Other4th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2007
CountryJapan
CityFukuoka
Period07/11/707/11/9

Keywords

  • Electro-rheological fluid
  • Numerical analysis
  • One-sided electrodes
  • Silicon wafer
  • Vacuum

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering

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