Development of nanoscale thermal properties measurement technique by using near-field optics

Yoshihiro Taguchi, Yukihiro Horiguchi, Mikako Kobayashi, Toshiharu Saiki, Yuji Nagasaka

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The nanoscale thermal properties are becoming increasingly important for the thermal design of electronic devises as the MEMS technology makes progress. The thermal conductivity of nanoscale thin film is remarkably lower than that of bulk materials because of its various size effects. In addition, the nano-materials will have pointing defects or lattice imperfections during the production process. Therefore, nanoscale thermal properties measurement technique, which can be applied in-situ or in-process, is required. We have developed a new thermal properties measurement technique by using near-field optics, which targets spatial resolution better than 100 nm (up to 10 nm) and is applicable to measure the thermal properties of nanoscale materials in-situ. In this article, in order to check the validity of the control system, the topographic image of diffraction grating is monitored. Moreover, the temperature change of Al thin film is detected as a thermoreflectance signal. Finally, the capability of our present work, to measure the thermal properties of nanostructures, is discussed.

Original languageEnglish
Pages (from-to)483-489
Number of pages7
JournalJSME International Journal, Series B: Fluids and Thermal Engineering
Volume47
Issue number3
DOIs
Publication statusPublished - 2004 Aug

Fingerprint

Optics
near fields
Thermodynamic properties
thermodynamic properties
optics
Thin films
Defects
defects
Diffraction gratings
Optical resolving power
thin films
gratings (spectra)
crystal defects
microelectromechanical systems
MEMS
Nanostructures
Thermal conductivity
thermal conductivity
spatial resolution
Control systems

Keywords

  • Near-field optics
  • Thermal conductivity
  • Thermal diffusivity
  • Thermoreflectance

ASJC Scopus subject areas

  • Mechanical Engineering
  • Physical and Theoretical Chemistry
  • Fluid Flow and Transfer Processes

Cite this

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abstract = "The nanoscale thermal properties are becoming increasingly important for the thermal design of electronic devises as the MEMS technology makes progress. The thermal conductivity of nanoscale thin film is remarkably lower than that of bulk materials because of its various size effects. In addition, the nano-materials will have pointing defects or lattice imperfections during the production process. Therefore, nanoscale thermal properties measurement technique, which can be applied in-situ or in-process, is required. We have developed a new thermal properties measurement technique by using near-field optics, which targets spatial resolution better than 100 nm (up to 10 nm) and is applicable to measure the thermal properties of nanoscale materials in-situ. In this article, in order to check the validity of the control system, the topographic image of diffraction grating is monitored. Moreover, the temperature change of Al thin film is detected as a thermoreflectance signal. Finally, the capability of our present work, to measure the thermal properties of nanostructures, is discussed.",
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author = "Yoshihiro Taguchi and Yukihiro Horiguchi and Mikako Kobayashi and Toshiharu Saiki and Yuji Nagasaka",
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AU - Taguchi, Yoshihiro

AU - Horiguchi, Yukihiro

AU - Kobayashi, Mikako

AU - Saiki, Toshiharu

AU - Nagasaka, Yuji

PY - 2004/8

Y1 - 2004/8

N2 - The nanoscale thermal properties are becoming increasingly important for the thermal design of electronic devises as the MEMS technology makes progress. The thermal conductivity of nanoscale thin film is remarkably lower than that of bulk materials because of its various size effects. In addition, the nano-materials will have pointing defects or lattice imperfections during the production process. Therefore, nanoscale thermal properties measurement technique, which can be applied in-situ or in-process, is required. We have developed a new thermal properties measurement technique by using near-field optics, which targets spatial resolution better than 100 nm (up to 10 nm) and is applicable to measure the thermal properties of nanoscale materials in-situ. In this article, in order to check the validity of the control system, the topographic image of diffraction grating is monitored. Moreover, the temperature change of Al thin film is detected as a thermoreflectance signal. Finally, the capability of our present work, to measure the thermal properties of nanostructures, is discussed.

AB - The nanoscale thermal properties are becoming increasingly important for the thermal design of electronic devises as the MEMS technology makes progress. The thermal conductivity of nanoscale thin film is remarkably lower than that of bulk materials because of its various size effects. In addition, the nano-materials will have pointing defects or lattice imperfections during the production process. Therefore, nanoscale thermal properties measurement technique, which can be applied in-situ or in-process, is required. We have developed a new thermal properties measurement technique by using near-field optics, which targets spatial resolution better than 100 nm (up to 10 nm) and is applicable to measure the thermal properties of nanoscale materials in-situ. In this article, in order to check the validity of the control system, the topographic image of diffraction grating is monitored. Moreover, the temperature change of Al thin film is detected as a thermoreflectance signal. Finally, the capability of our present work, to measure the thermal properties of nanostructures, is discussed.

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