Development of NiFe micro magnet stripes for solid-state NMR quantum computing

A. Takahashi; Dong F. Wang; Y. Matsumoto; K. M. Itoh

doi:10.1117/12.582248

Development of NiFe micro magnet stripes for solid-state NMR quantum computing

A. Takahashi, Dong F. Wang, Y. Matsumoto, K. M. Itoh

Department of Applied Physics and Physico-Informatics

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

Abstract

An all-silicon quantum computer architecture using ²⁹Si nuclear spins qubits buried in the spin-free matrix of ²⁸Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the ²⁹Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring ²⁹Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm ²) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.

Original language	English
Article number	16
Pages (from-to)	81-88
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5650
DOIs	https://doi.org/10.1117/12.582248
Publication status	Published - 2005 Jun 20
Event	Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II - Sydney, Australia Duration: 2004 Dec 13 → 2004 Dec 15

Keywords

CO/NH
Magnetic field gradient
Magnetic simulation
Micro-magnet
Microfabrication
Micromachining
NiFe
NMR quantum computing
Reactive ion etching (RIE)

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.582248

Cite this

@article{a2b4d3b0c0184f209b2d78f43efb29a9,

title = "Development of NiFe micro magnet stripes for solid-state NMR quantum computing",

abstract = "An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm 2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.",

keywords = "CO/NH, Magnetic field gradient, Magnetic simulation, Micro-magnet, Microfabrication, Micromachining, NiFe, NMR quantum computing, Reactive ion etching (RIE)",

author = "A. Takahashi and Wang, {Dong F.} and Y. Matsumoto and Itoh, {K. M.}",

year = "2005",

month = jun,

day = "20",

doi = "10.1117/12.582248",

language = "English",

volume = "5650",

pages = "81--88",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II ; Conference date: 13-12-2004 Through 15-12-2004",

}

TY - JOUR

T1 - Development of NiFe micro magnet stripes for solid-state NMR quantum computing

AU - Takahashi, A.

AU - Wang, Dong F.

AU - Matsumoto, Y.

AU - Itoh, K. M.

PY - 2005/6/20

Y1 - 2005/6/20

N2 - An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm 2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.

AB - An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm 2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.

KW - CO/NH

KW - Magnetic field gradient

KW - Magnetic simulation

KW - Micro-magnet

KW - Microfabrication

KW - Micromachining

KW - NiFe

KW - NMR quantum computing

KW - Reactive ion etching (RIE)

UR - http://www.scopus.com/inward/record.url?scp=20344378974&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=20344378974&partnerID=8YFLogxK

U2 - 10.1117/12.582248

DO - 10.1117/12.582248

M3 - Conference article

AN - SCOPUS:20344378974

VL - 5650

SP - 81

EP - 88

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

M1 - 16

T2 - Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II

Y2 - 13 December 2004 through 15 December 2004

ER -

Development of NiFe micro magnet stripes for solid-state NMR quantum computing

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this