Abstract
An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm 2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Editors | J.-C. Chiao, D.N. Jamieson, L. Faraone, A.S. Dzurak |
| Pages | 81-88 |
| Number of pages | 8 |
| Volume | 5650 |
| DOIs | |
| Publication status | Published - 2005 |
| Event | Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II - Sydney, Australia Duration: 2004 Dec 13 → 2004 Dec 15 |
Other
| Other | Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II |
|---|---|
| Country | Australia |
| City | Sydney |
| Period | 04/12/13 → 04/12/15 |
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Keywords
- CO/NH
- Magnetic field gradient
- Magnetic simulation
- Micro-magnet
- Microfabrication
- Micromachining
- NiFe
- NMR quantum computing
- Reactive ion etching (RIE)
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics
Cite this
Development of NiFe micro magnet stripes for solid-state NMR quantum computing. / Takahashi, A.; Wang, Dong F.; Matsumoto, Yoshinori; Itoh, Kohei M.
Proceedings of SPIE - The International Society for Optical Engineering. ed. / J.-C. Chiao; D.N. Jamieson; L. Faraone; A.S. Dzurak. Vol. 5650 2005. p. 81-88 16.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Development of NiFe micro magnet stripes for solid-state NMR quantum computing
AU - Takahashi, A.
AU - Wang, Dong F.
AU - Matsumoto, Yoshinori
AU - Itoh, Kohei M
PY - 2005
Y1 - 2005
N2 - An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm 2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.
AB - An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm 2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.
KW - CO/NH
KW - Magnetic field gradient
KW - Magnetic simulation
KW - Micro-magnet
KW - Microfabrication
KW - Micromachining
KW - NiFe
KW - NMR quantum computing
KW - Reactive ion etching (RIE)
UR - http://www.scopus.com/inward/record.url?scp=20344378974&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=20344378974&partnerID=8YFLogxK
U2 - 10.1117/12.582248
DO - 10.1117/12.582248
M3 - Conference contribution
AN - SCOPUS:20344378974
VL - 5650
SP - 81
EP - 88
BT - Proceedings of SPIE - The International Society for Optical Engineering
A2 - Chiao, J.-C.
A2 - Jamieson, D.N.
A2 - Faraone, L.
A2 - Dzurak, A.S.
ER -