Development of NiFe micro magnet stripes for solid-state NMR quantum computing

A. Takahashi, Dong F. Wang, Y. Matsumoto, K. M. Itoh

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm 2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.

Original languageEnglish
Article number16
Pages (from-to)81-88
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5650
DOIs
Publication statusPublished - 2005 Jun 20
EventMicro- and Nanotechnology: Materials, Processes, Packaging, and Systems II - Sydney, Australia
Duration: 2004 Dec 132004 Dec 15

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Keywords

  • CO/NH
  • Magnetic field gradient
  • Magnetic simulation
  • Micro-magnet
  • Microfabrication
  • Micromachining
  • NiFe
  • NMR quantum computing
  • Reactive ion etching (RIE)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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