Diagnostics of an inductively coupled CF4/Ar plasma

Kazuya Hioki, Hajime Hirata, Shosaku Matsumura, Zoran Lj Petrović, Toshiaki Makabe

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

The properties of a mixture of argon and CF4 were studied. This mixture is used in plasma etching of SiO2 and more importantly its properties may be compared to those of the pure argon plasma to observe the effect of CF4 kinetics, especially the effect of the presence of negative ions. The experimental studies carried out serve as the basis for tests of theoretical models of inductively coupled plasma which are the foundation for computer aided design (CAD) and control of the next generation plasma devices that are being developed.

Original languageEnglish
Pages (from-to)864-872
Number of pages9
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number3
DOIs
Publication statusPublished - 2000 May

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Argon
Plasma devices
Plasmas
plasma generators
Plasma etching
argon plasma
Inductively coupled plasma
plasma etching
computer aided design
negative ions
Computer aided design
Negative ions
argon
Kinetics
kinetics

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Diagnostics of an inductively coupled CF4/Ar plasma. / Hioki, Kazuya; Hirata, Hajime; Matsumura, Shosaku; Petrović, Zoran Lj; Makabe, Toshiaki.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 18, No. 3, 05.2000, p. 864-872.

Research output: Contribution to journalArticle

Hioki, K, Hirata, H, Matsumura, S, Petrović, ZL & Makabe, T 2000, 'Diagnostics of an inductively coupled CF4/Ar plasma', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 18, no. 3, pp. 864-872. https://doi.org/10.1116/1.582268
Hioki, Kazuya ; Hirata, Hajime ; Matsumura, Shosaku ; Petrović, Zoran Lj ; Makabe, Toshiaki. / Diagnostics of an inductively coupled CF4/Ar plasma. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2000 ; Vol. 18, No. 3. pp. 864-872.
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