Diagnostics of low-frequency ch4 and h2 discharge by optical emission spectroscopy

T. Kokubo; F. Tochikubo; T. Makabe

doi:10.1088/0022-3727/22/9/007

Diagnostics of low-frequency ch₄ and h₂ discharge by optical emission spectroscopy

T. Kokubo, F. Tochikubo, T. Makabe

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Abstract

Low–frequency glow discharge for the deposition of hydrogenated amorphous carbon has been investigated by using time– and space–resolved emission spectroscopy as the parameters of pressure (0.3and<pand<3.0 Torr) and gas mixture ratio between CH₄ and H₂ at 100 kHz and 10 SCCM. The authors ascertain the temporal structure of the discharge. The CH(B² Sigma ⁻; v’=0 to X² Pi; v”=0) band head in CH₄/H₂ is selected as a probe for monitoring the dynamics of the electron transport. The Ar I (3p⁵5p:3p₁ to 3p⁵4s:1s₂) line in pure Ar is also observed for comparison with the discharge structure in CH₄/H₂. The glow discharge property changes significantly with total gas pressure in the CH₄/H₂ mixture under investigation. Considerable variation is observed between the sustaining voltage and the emission profile of the discharge with the increase of mixture ratio of CH₄ to H₂ at constant power. Remarkable differences in the emission profile exist between CH₄/H₂ and Ar. The authors show that the drift velocity of the dominant ions plays an important role in deciding the structure of the discharge especially at low frequency, and that the plasma bulk potential in Ar is higher than that in H₂ at the same applied voltage.

Original language	English
Pages (from-to)	1281-1287
Number of pages	7
Journal	Journal of Physics D: Applied Physics
Volume	22
Issue number	9
DOIs	https://doi.org/10.1088/0022-3727/22/9/007
Publication status	Published - 1989 Sept 14

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Acoustics and Ultrasonics
Surfaces, Coatings and Films

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10.1088/0022-3727/22/9/007

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@article{bf0d3cf781364549babd3b9f48aceaba,

title = "Diagnostics of low-frequency ch4 and h2 discharge by optical emission spectroscopy",

abstract = "Low–frequency glow discharge for the deposition of hydrogenated amorphous carbon has been investigated by using time– and space–resolved emission spectroscopy as the parameters of pressure (0.3and4 and H2 at 100 kHz and 10 SCCM. The authors ascertain the temporal structure of the discharge. The CH(B2 Sigma −; v{\textquoteright}=0 to X2 Pi; v”=0) band head in CH4/H2 is selected as a probe for monitoring the dynamics of the electron transport. The Ar I (3p55p:3p1 to 3p54s:1s2) line in pure Ar is also observed for comparison with the discharge structure in CH4/H2. The glow discharge property changes significantly with total gas pressure in the CH4/H2 mixture under investigation. Considerable variation is observed between the sustaining voltage and the emission profile of the discharge with the increase of mixture ratio of CH4 to H2 at constant power. Remarkable differences in the emission profile exist between CH4/H2 and Ar. The authors show that the drift velocity of the dominant ions plays an important role in deciding the structure of the discharge especially at low frequency, and that the plasma bulk potential in Ar is higher than that in H2 at the same applied voltage.",

author = "T. Kokubo and F. Tochikubo and T. Makabe",

year = "1989",

month = sep,

day = "14",

doi = "10.1088/0022-3727/22/9/007",

language = "English",

volume = "22",

pages = "1281--1287",

journal = "Journal Physics D: Applied Physics",

issn = "0022-3727",

publisher = "IOP Publishing Ltd.",

number = "9",

}

TY - JOUR

T1 - Diagnostics of low-frequency ch4 and h2 discharge by optical emission spectroscopy

AU - Kokubo, T.

AU - Tochikubo, F.

AU - Makabe, T.

PY - 1989/9/14

Y1 - 1989/9/14

N2 - Low–frequency glow discharge for the deposition of hydrogenated amorphous carbon has been investigated by using time– and space–resolved emission spectroscopy as the parameters of pressure (0.3and4 and H2 at 100 kHz and 10 SCCM. The authors ascertain the temporal structure of the discharge. The CH(B2 Sigma −; v’=0 to X2 Pi; v”=0) band head in CH4/H2 is selected as a probe for monitoring the dynamics of the electron transport. The Ar I (3p55p:3p1 to 3p54s:1s2) line in pure Ar is also observed for comparison with the discharge structure in CH4/H2. The glow discharge property changes significantly with total gas pressure in the CH4/H2 mixture under investigation. Considerable variation is observed between the sustaining voltage and the emission profile of the discharge with the increase of mixture ratio of CH4 to H2 at constant power. Remarkable differences in the emission profile exist between CH4/H2 and Ar. The authors show that the drift velocity of the dominant ions plays an important role in deciding the structure of the discharge especially at low frequency, and that the plasma bulk potential in Ar is higher than that in H2 at the same applied voltage.

AB - Low–frequency glow discharge for the deposition of hydrogenated amorphous carbon has been investigated by using time– and space–resolved emission spectroscopy as the parameters of pressure (0.3and4 and H2 at 100 kHz and 10 SCCM. The authors ascertain the temporal structure of the discharge. The CH(B2 Sigma −; v’=0 to X2 Pi; v”=0) band head in CH4/H2 is selected as a probe for monitoring the dynamics of the electron transport. The Ar I (3p55p:3p1 to 3p54s:1s2) line in pure Ar is also observed for comparison with the discharge structure in CH4/H2. The glow discharge property changes significantly with total gas pressure in the CH4/H2 mixture under investigation. Considerable variation is observed between the sustaining voltage and the emission profile of the discharge with the increase of mixture ratio of CH4 to H2 at constant power. Remarkable differences in the emission profile exist between CH4/H2 and Ar. The authors show that the drift velocity of the dominant ions plays an important role in deciding the structure of the discharge especially at low frequency, and that the plasma bulk potential in Ar is higher than that in H2 at the same applied voltage.

UR - http://www.scopus.com/inward/record.url?scp=0024731436&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0024731436&partnerID=8YFLogxK

U2 - 10.1088/0022-3727/22/9/007

DO - 10.1088/0022-3727/22/9/007

M3 - Article

AN - SCOPUS:0024731436

SN - 0022-3727

VL - 22

SP - 1281

EP - 1287

JO - Journal Physics D: Applied Physics

JF - Journal Physics D: Applied Physics

IS - 9

ER -

Diagnostics of low-frequency ch₄ and h₂ discharge by optical emission spectroscopy

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