Abstract
A new direct-deposition process for silica thin films was developed using silicon alkoxide solutions. Silica thin films incorporating organic groups, such as methyl (CH3) and phenyl (C6H5) groups, were deposited on substrates from aqueous and ethanol solutions of organyltrialkoxysilane. Silica films without organic groups were also formed using ethanol solution of tetraalkoxysilane with aqueous ammonia. Composition of the deposited silica films were influenced by temperature and pH of the solutions and the starting alkoxides. From aqueous solutions containing organyltrialkoxysilane and organic dyes, such as Disperse Red 1 and Rhodamine B, silica films including the dyes were directly prepared on substrates. The composition of silica-organic hybrid films prepared by the deposition method was successfully controlled by selecting the deposition condition and the starting materials.
| Original language | English |
|---|---|
| Title of host publication | Materials Research Society Symposium - Proceedings |
| Publisher | Materials Research Society |
| Pages | 409-414 |
| Number of pages | 6 |
| Volume | 435 |
| Publication status | Published - 1996 |
| Event | Proceedings of the 1996 MRS Spring Symposium - San Francisco, CA, USA Duration: 1996 Apr 8 → 1996 Apr 12 |
Other
| Other | Proceedings of the 1996 MRS Spring Symposium |
|---|---|
| City | San Francisco, CA, USA |
| Period | 96/4/8 → 96/4/12 |
Fingerprint
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
Cite this
Direct deposition of silica films containing organic groups and dyes from silicon alkoxide solutions. / Oh, Junrok; Imai, Hiroaki; Hirashima, Hiroshi; Tsukuma, Koji.
Materials Research Society Symposium - Proceedings. Vol. 435 Materials Research Society, 1996. p. 409-414.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Direct deposition of silica films containing organic groups and dyes from silicon alkoxide solutions
AU - Oh, Junrok
AU - Imai, Hiroaki
AU - Hirashima, Hiroshi
AU - Tsukuma, Koji
PY - 1996
Y1 - 1996
N2 - A new direct-deposition process for silica thin films was developed using silicon alkoxide solutions. Silica thin films incorporating organic groups, such as methyl (CH3) and phenyl (C6H5) groups, were deposited on substrates from aqueous and ethanol solutions of organyltrialkoxysilane. Silica films without organic groups were also formed using ethanol solution of tetraalkoxysilane with aqueous ammonia. Composition of the deposited silica films were influenced by temperature and pH of the solutions and the starting alkoxides. From aqueous solutions containing organyltrialkoxysilane and organic dyes, such as Disperse Red 1 and Rhodamine B, silica films including the dyes were directly prepared on substrates. The composition of silica-organic hybrid films prepared by the deposition method was successfully controlled by selecting the deposition condition and the starting materials.
AB - A new direct-deposition process for silica thin films was developed using silicon alkoxide solutions. Silica thin films incorporating organic groups, such as methyl (CH3) and phenyl (C6H5) groups, were deposited on substrates from aqueous and ethanol solutions of organyltrialkoxysilane. Silica films without organic groups were also formed using ethanol solution of tetraalkoxysilane with aqueous ammonia. Composition of the deposited silica films were influenced by temperature and pH of the solutions and the starting alkoxides. From aqueous solutions containing organyltrialkoxysilane and organic dyes, such as Disperse Red 1 and Rhodamine B, silica films including the dyes were directly prepared on substrates. The composition of silica-organic hybrid films prepared by the deposition method was successfully controlled by selecting the deposition condition and the starting materials.
UR - http://www.scopus.com/inward/record.url?scp=0030386182&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0030386182&partnerID=8YFLogxK
M3 - Conference contribution
VL - 435
SP - 409
EP - 414
BT - Materials Research Society Symposium - Proceedings
PB - Materials Research Society
ER -