TY - JOUR
T1 - Effect of dilution gas on hardness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure plasma enhanced CVD
AU - Noborisaka, M.
AU - Tachimoto, Y.
AU - Horikoshi, R.
AU - Shirakura, A.
AU - Suzuki, T.
PY - 2013
Y1 - 2013
N2 - The deposition of hydrogenated amorphous carbon (a-C:H)-based films at atmospheric pressure is a cost-effective process without using a high-vacuum technique. In this study, we synthesized a-C:H-based films by atmospheric pressure-plasma enhanced CVD method from C2H2/He and C2H2/N2 mixture gas and investigated the effect of dilution gas on the hardness of the films. The film deposited from C 2H2/N2 contained nitrogen elements with forming C-N bonds and the film was softer than a-C:H film deposited from C 2H2/He. The hardness of the film deposited from C 2H2/He was 1.1 GPa and twice higher than that from C 2H2/N2.
AB - The deposition of hydrogenated amorphous carbon (a-C:H)-based films at atmospheric pressure is a cost-effective process without using a high-vacuum technique. In this study, we synthesized a-C:H-based films by atmospheric pressure-plasma enhanced CVD method from C2H2/He and C2H2/N2 mixture gas and investigated the effect of dilution gas on the hardness of the films. The film deposited from C 2H2/N2 contained nitrogen elements with forming C-N bonds and the film was softer than a-C:H film deposited from C 2H2/He. The hardness of the film deposited from C 2H2/He was 1.1 GPa and twice higher than that from C 2H2/N2.
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U2 - 10.1088/1742-6596/417/1/012044
DO - 10.1088/1742-6596/417/1/012044
M3 - Conference article
AN - SCOPUS:84875876993
SN - 1742-6588
VL - 417
JO - Journal of Physics: Conference Series
JF - Journal of Physics: Conference Series
IS - 1
M1 - 012044
T2 - 15th International Conference on Thin Films, ICTF 2011
Y2 - 8 November 2011 through 11 November 2011
ER -