Effect of dilution gas on hardness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure plasma enhanced CVD

M. Noborisaka, Y. Tachimoto, R. Horikoshi, A. Shirakura, Tetsuya Suzuki

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The deposition of hydrogenated amorphous carbon (a-C:H)-based films at atmospheric pressure is a cost-effective process without using a high-vacuum technique. In this study, we synthesized a-C:H-based films by atmospheric pressure-plasma enhanced CVD method from C2H2/He and C2H2/N2 mixture gas and investigated the effect of dilution gas on the hardness of the films. The film deposited from C 2H2/N2 contained nitrogen elements with forming C-N bonds and the film was softer than a-C:H film deposited from C 2H2/He. The hardness of the film deposited from C 2H2/He was 1.1 GPa and twice higher than that from C 2H2/N2.

Original languageEnglish
Article number012044
JournalJournal of Physics: Conference Series
Volume417
Issue number1
DOIs
Publication statusPublished - 2013

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dilution
atmospheric pressure
hardness
vapor deposition
carbon
gases
high vacuum
gas mixtures
costs
nitrogen

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Effect of dilution gas on hardness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure plasma enhanced CVD. / Noborisaka, M.; Tachimoto, Y.; Horikoshi, R.; Shirakura, A.; Suzuki, Tetsuya.

In: Journal of Physics: Conference Series, Vol. 417, No. 1, 012044, 2013.

Research output: Contribution to journalArticle

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AU - Suzuki, Tetsuya

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