Effect of metallic underlayer on structural and magnetic properties of sputtered Fe3O4 films

F. Qin, Y. Nozaki, K. Matsuyama

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

High-quality Fe3O4 films are fabricated on glass substrates with metallic underlayers of Cr/Cu or Al by RF magnetron sputtering at relatively low deposition temperature of 300°C. The measured values of saturation magnetization Ms are 462 emu/cm3 for Al(50 nm)/Fe3O4(200 nm) and 422 emu/cm3 for Cr(45 nm)/Cu(300 nm)/ Fe3O4(200 nm), which are drastically enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477 emu/cm 3.

Original languageEnglish
Pages (from-to)e1835-e1837
JournalJournal of Magnetism and Magnetic Materials
Volume272-276
Issue numberSUPPL. 1
DOIs
Publication statusPublished - 2004 May 1
Externally publishedYes

Keywords

  • FeO
  • Thin film
  • Verwey transition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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