Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar

Toshikazu Sato; Toshiaki Makabe

doi:10.1063/1.2137883

Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar

Toshikazu Sato, Toshiaki Makabe

Vice-President

Research output: Contribution to journal › Article › peer-review

27 Citations (Scopus)

Abstract

We numerically predicted the spatial distribution of Ar metastables in an inductively coupled plasma (ICP) source; this distribution may be an indicator of the behavior of long-lived neutral radicals in a reactive plasma. We investigated the effect of metastables on the sustaining mechanism in ICP in Ar. The predicted two-dimensional profile of Ar metastables agreed reasonably well with experimental results. The transition of the sustaining mechanism from direct ionization to stepwise ionization is found as a function of input power at 50 mTorr. In addition, a strong hysteresis of plasma density is predicted between the increasing and decreasing phases of the input power based on the stepwise ionization of Ar metastables in the ICP.

Original language	English
Article number	113304
Journal	Journal of Applied Physics
Volume	98
Issue number	11
DOIs	https://doi.org/10.1063/1.2137883
Publication status	Published - 2005 Dec 27

ASJC Scopus subject areas

Physics and Astronomy(all)

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AB - We numerically predicted the spatial distribution of Ar metastables in an inductively coupled plasma (ICP) source; this distribution may be an indicator of the behavior of long-lived neutral radicals in a reactive plasma. We investigated the effect of metastables on the sustaining mechanism in ICP in Ar. The predicted two-dimensional profile of Ar metastables agreed reasonably well with experimental results. The transition of the sustaining mechanism from direct ionization to stepwise ionization is found as a function of input power at 50 mTorr. In addition, a strong hysteresis of plasma density is predicted between the increasing and decreasing phases of the input power based on the stepwise ionization of Ar metastables in the ICP.

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