Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar

Toshikazu Sato; Toshiaki Makabe

doi:10.1063/1.2137883

Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar

Toshikazu Sato, Toshiaki Makabe

Research output: Contribution to journal › Article › peer-review

29 Citations (Scopus)

Abstract

We numerically predicted the spatial distribution of Ar metastables in an inductively coupled plasma (ICP) source; this distribution may be an indicator of the behavior of long-lived neutral radicals in a reactive plasma. We investigated the effect of metastables on the sustaining mechanism in ICP in Ar. The predicted two-dimensional profile of Ar metastables agreed reasonably well with experimental results. The transition of the sustaining mechanism from direct ionization to stepwise ionization is found as a function of input power at 50 mTorr. In addition, a strong hysteresis of plasma density is predicted between the increasing and decreasing phases of the input power based on the stepwise ionization of Ar metastables in the ICP.

Original language	English
Article number	113304
Journal	Journal of Applied Physics
Volume	98
Issue number	11
DOIs	https://doi.org/10.1063/1.2137883
Publication status	Published - 2005
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)

Access to Document

10.1063/1.2137883

Cite this

@article{bacc95ee5b56431288a0426fba43769b,

title = "Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar",

abstract = "We numerically predicted the spatial distribution of Ar metastables in an inductively coupled plasma (ICP) source; this distribution may be an indicator of the behavior of long-lived neutral radicals in a reactive plasma. We investigated the effect of metastables on the sustaining mechanism in ICP in Ar. The predicted two-dimensional profile of Ar metastables agreed reasonably well with experimental results. The transition of the sustaining mechanism from direct ionization to stepwise ionization is found as a function of input power at 50 mTorr. In addition, a strong hysteresis of plasma density is predicted between the increasing and decreasing phases of the input power based on the stepwise ionization of Ar metastables in the ICP.",

author = "Toshikazu Sato and Toshiaki Makabe",

note = "Funding Information: This work was supported in part by a Grant-in-Aid for the 21st Century Center of Excellence for Optical and Electronic Device Technology for Access Networks from the Ministry of Education, Culture, Sports, Science, and Technology of Japan.",

year = "2005",

doi = "10.1063/1.2137883",

language = "English",

volume = "98",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

number = "11",

}

TY - JOUR

T1 - Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar

AU - Sato, Toshikazu

AU - Makabe, Toshiaki

N1 - Funding Information: This work was supported in part by a Grant-in-Aid for the 21st Century Center of Excellence for Optical and Electronic Device Technology for Access Networks from the Ministry of Education, Culture, Sports, Science, and Technology of Japan.

PY - 2005

Y1 - 2005

N2 - We numerically predicted the spatial distribution of Ar metastables in an inductively coupled plasma (ICP) source; this distribution may be an indicator of the behavior of long-lived neutral radicals in a reactive plasma. We investigated the effect of metastables on the sustaining mechanism in ICP in Ar. The predicted two-dimensional profile of Ar metastables agreed reasonably well with experimental results. The transition of the sustaining mechanism from direct ionization to stepwise ionization is found as a function of input power at 50 mTorr. In addition, a strong hysteresis of plasma density is predicted between the increasing and decreasing phases of the input power based on the stepwise ionization of Ar metastables in the ICP.

AB - We numerically predicted the spatial distribution of Ar metastables in an inductively coupled plasma (ICP) source; this distribution may be an indicator of the behavior of long-lived neutral radicals in a reactive plasma. We investigated the effect of metastables on the sustaining mechanism in ICP in Ar. The predicted two-dimensional profile of Ar metastables agreed reasonably well with experimental results. The transition of the sustaining mechanism from direct ionization to stepwise ionization is found as a function of input power at 50 mTorr. In addition, a strong hysteresis of plasma density is predicted between the increasing and decreasing phases of the input power based on the stepwise ionization of Ar metastables in the ICP.

UR - http://www.scopus.com/inward/record.url?scp=29144478382&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=29144478382&partnerID=8YFLogxK

U2 - 10.1063/1.2137883

DO - 10.1063/1.2137883

M3 - Article

AN - SCOPUS:29144478382

VL - 98

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 11

M1 - 113304

ER -

Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this