Abstract
We numerically predicted the spatial distribution of Ar metastables in an inductively coupled plasma (ICP) source; this distribution may be an indicator of the behavior of long-lived neutral radicals in a reactive plasma. We investigated the effect of metastables on the sustaining mechanism in ICP in Ar. The predicted two-dimensional profile of Ar metastables agreed reasonably well with experimental results. The transition of the sustaining mechanism from direct ionization to stepwise ionization is found as a function of input power at 50 mTorr. In addition, a strong hysteresis of plasma density is predicted between the increasing and decreasing phases of the input power based on the stepwise ionization of Ar metastables in the ICP.
| Original language | English |
|---|---|
| Article number | 113304 |
| Journal | Journal of Applied Physics |
| Volume | 98 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - 2005 Dec 27 |
ASJC Scopus subject areas
- Physics and Astronomy(all)
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Sato, T., & Makabe, T. (2005). Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar. Journal of Applied Physics, 98(11), [113304]. https://doi.org/10.1063/1.2137883