Effect of pretreatment conditions of Si-CuCl mixtures on the rate and selectivity in the reaction of silicon with methanol using copper(I) chloride catalyst

Masaki Okamoto, Mituaki Osaka, Ken Ichi Yamamoto, Eiichi Suzuki, Yoshio Ono

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

The reaction of silicon with methanol was carried out in a fixed-bed flow reactor using copper(I) chloride as a catalyst. The rate of the reaction and the selectivity for trimethoxysilane greatly depends on the preheating conditions of the Si-CuCl mixture prior to feeding methanol. When the preheating temperature was above 623 K. trimethoxysilane was formed with selectivities around 65%, the remainder being tetramethoxysilane. The XRD and EPMA studies revealed that the Cu 3 Si phase was scattered on the silicon surface upon heating the Si-CuCl mixture above 623 K. When the preheating temperature was below 553 K, the rate of the reaction was faster than that for higher preheating temperatures, and the selectivity for trimethoxysilane was very high (>98%). In this case, however, no evidence for the Cu 3 Si phase was obtained. Pits on the silicon surface are formed upon the reaction with methanol. When the pretreatment temperature is high (723 K), the number of pits is close to that of the Cu 3 Si patches which were present before starting the reaction. The number does not change with reaction time. This indicates that silicon atoms are consumed only around the areas where the Cu 3 Si patches are located. The number of pits was far greater in the reaction with lower preheating temperatures (<513 K) compared with that with higher preheating. The kinetics of the reaction also depended on the preheating temperature of the Si-CuCl mixtures.

Original languageEnglish
Pages (from-to)64-85
Number of pages22
JournalJournal of Catalysis
Volume143
Issue number1
DOIs
Publication statusPublished - 1993 Jan 1
Externally publishedYes

Fingerprint

Preheating
Silicon
pretreatment
Methanol
methyl alcohol
selectivity
chlorides
Copper
catalysts
copper
Catalysts
heating
silicon
Temperature
temperature
Electron probe microanalysis
cuprous chloride
reaction time
beds
Heating

ASJC Scopus subject areas

  • Catalysis
  • Physical and Theoretical Chemistry

Cite this

Effect of pretreatment conditions of Si-CuCl mixtures on the rate and selectivity in the reaction of silicon with methanol using copper(I) chloride catalyst. / Okamoto, Masaki; Osaka, Mituaki; Yamamoto, Ken Ichi; Suzuki, Eiichi; Ono, Yoshio.

In: Journal of Catalysis, Vol. 143, No. 1, 01.01.1993, p. 64-85.

Research output: Contribution to journalArticle

@article{14c6e91eecec453bb360904ec6c35108,
title = "Effect of pretreatment conditions of Si-CuCl mixtures on the rate and selectivity in the reaction of silicon with methanol using copper(I) chloride catalyst",
abstract = "The reaction of silicon with methanol was carried out in a fixed-bed flow reactor using copper(I) chloride as a catalyst. The rate of the reaction and the selectivity for trimethoxysilane greatly depends on the preheating conditions of the Si-CuCl mixture prior to feeding methanol. When the preheating temperature was above 623 K. trimethoxysilane was formed with selectivities around 65{\%}, the remainder being tetramethoxysilane. The XRD and EPMA studies revealed that the Cu 3 Si phase was scattered on the silicon surface upon heating the Si-CuCl mixture above 623 K. When the preheating temperature was below 553 K, the rate of the reaction was faster than that for higher preheating temperatures, and the selectivity for trimethoxysilane was very high (>98{\%}). In this case, however, no evidence for the Cu 3 Si phase was obtained. Pits on the silicon surface are formed upon the reaction with methanol. When the pretreatment temperature is high (723 K), the number of pits is close to that of the Cu 3 Si patches which were present before starting the reaction. The number does not change with reaction time. This indicates that silicon atoms are consumed only around the areas where the Cu 3 Si patches are located. The number of pits was far greater in the reaction with lower preheating temperatures (<513 K) compared with that with higher preheating. The kinetics of the reaction also depended on the preheating temperature of the Si-CuCl mixtures.",
author = "Masaki Okamoto and Mituaki Osaka and Yamamoto, {Ken Ichi} and Eiichi Suzuki and Yoshio Ono",
year = "1993",
month = "1",
day = "1",
doi = "10.1006/jcat.1993.1254",
language = "English",
volume = "143",
pages = "64--85",
journal = "Journal of Catalysis",
issn = "0021-9517",
publisher = "Academic Press Inc.",
number = "1",

}

TY - JOUR

T1 - Effect of pretreatment conditions of Si-CuCl mixtures on the rate and selectivity in the reaction of silicon with methanol using copper(I) chloride catalyst

AU - Okamoto, Masaki

AU - Osaka, Mituaki

AU - Yamamoto, Ken Ichi

AU - Suzuki, Eiichi

AU - Ono, Yoshio

PY - 1993/1/1

Y1 - 1993/1/1

N2 - The reaction of silicon with methanol was carried out in a fixed-bed flow reactor using copper(I) chloride as a catalyst. The rate of the reaction and the selectivity for trimethoxysilane greatly depends on the preheating conditions of the Si-CuCl mixture prior to feeding methanol. When the preheating temperature was above 623 K. trimethoxysilane was formed with selectivities around 65%, the remainder being tetramethoxysilane. The XRD and EPMA studies revealed that the Cu 3 Si phase was scattered on the silicon surface upon heating the Si-CuCl mixture above 623 K. When the preheating temperature was below 553 K, the rate of the reaction was faster than that for higher preheating temperatures, and the selectivity for trimethoxysilane was very high (>98%). In this case, however, no evidence for the Cu 3 Si phase was obtained. Pits on the silicon surface are formed upon the reaction with methanol. When the pretreatment temperature is high (723 K), the number of pits is close to that of the Cu 3 Si patches which were present before starting the reaction. The number does not change with reaction time. This indicates that silicon atoms are consumed only around the areas where the Cu 3 Si patches are located. The number of pits was far greater in the reaction with lower preheating temperatures (<513 K) compared with that with higher preheating. The kinetics of the reaction also depended on the preheating temperature of the Si-CuCl mixtures.

AB - The reaction of silicon with methanol was carried out in a fixed-bed flow reactor using copper(I) chloride as a catalyst. The rate of the reaction and the selectivity for trimethoxysilane greatly depends on the preheating conditions of the Si-CuCl mixture prior to feeding methanol. When the preheating temperature was above 623 K. trimethoxysilane was formed with selectivities around 65%, the remainder being tetramethoxysilane. The XRD and EPMA studies revealed that the Cu 3 Si phase was scattered on the silicon surface upon heating the Si-CuCl mixture above 623 K. When the preheating temperature was below 553 K, the rate of the reaction was faster than that for higher preheating temperatures, and the selectivity for trimethoxysilane was very high (>98%). In this case, however, no evidence for the Cu 3 Si phase was obtained. Pits on the silicon surface are formed upon the reaction with methanol. When the pretreatment temperature is high (723 K), the number of pits is close to that of the Cu 3 Si patches which were present before starting the reaction. The number does not change with reaction time. This indicates that silicon atoms are consumed only around the areas where the Cu 3 Si patches are located. The number of pits was far greater in the reaction with lower preheating temperatures (<513 K) compared with that with higher preheating. The kinetics of the reaction also depended on the preheating temperature of the Si-CuCl mixtures.

UR - http://www.scopus.com/inward/record.url?scp=0002880079&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0002880079&partnerID=8YFLogxK

U2 - 10.1006/jcat.1993.1254

DO - 10.1006/jcat.1993.1254

M3 - Article

AN - SCOPUS:0002880079

VL - 143

SP - 64

EP - 85

JO - Journal of Catalysis

JF - Journal of Catalysis

SN - 0021-9517

IS - 1

ER -