Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method

Mayui Noborisaka, So Nagashima, Hidetaka Hayashi, Naoharu Ueda, Kyoko Kumagai, Akira Shirakura, Tetsuya Suzuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Silicon-based films have gained much interest as protective coatings for transparent polymeric materials. In this study, SiOC(-H) thin films were deposited on polycarbonate (PC) or Si substrates from trimethylsilane (TrMS) gas diluted with He gas by atmospheric pressure plasma enhanced CVD (AP-PECVD) method with varying substrate temperature, and transparency and hardness of the films were investigated. The films exhibited a good optical transparency with an optical transmittance of about 90% irrespective of the substrate temperature, and the hardness increased from 0.6 to 1.3 GPa as the substrate temperature increased from 60 to 140°C. The results are discussed in terms of chemical structural changes in the films according to the substrate temperature.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages217-222
Number of pages6
Volume1321
DOIs
Publication statusPublished - 2012
Event2011 MRS Spring Meeting - San Francisco, CA, United States
Duration: 2011 Apr 252011 Apr 29

Other

Other2011 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period11/4/2511/4/29

Fingerprint

Plasma enhanced chemical vapor deposition
Transparency
Atmospheric pressure
atmospheric pressure
hardness
Hardness
vapor deposition
Thin films
Substrates
thin films
polycarbonate
Temperature
Gases
temperature
protective coatings
Opacity
Protective coatings
Silicon
polycarbonates
Polycarbonates

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Noborisaka, M., Nagashima, S., Hayashi, H., Ueda, N., Kumagai, K., Shirakura, A., & Suzuki, T. (2012). Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. In Materials Research Society Symposium Proceedings (Vol. 1321, pp. 217-222) https://doi.org/10.1557/opl.2011.1191

Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. / Noborisaka, Mayui; Nagashima, So; Hayashi, Hidetaka; Ueda, Naoharu; Kumagai, Kyoko; Shirakura, Akira; Suzuki, Tetsuya.

Materials Research Society Symposium Proceedings. Vol. 1321 2012. p. 217-222.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Noborisaka, M, Nagashima, S, Hayashi, H, Ueda, N, Kumagai, K, Shirakura, A & Suzuki, T 2012, Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. in Materials Research Society Symposium Proceedings. vol. 1321, pp. 217-222, 2011 MRS Spring Meeting, San Francisco, CA, United States, 11/4/25. https://doi.org/10.1557/opl.2011.1191
Noborisaka M, Nagashima S, Hayashi H, Ueda N, Kumagai K, Shirakura A et al. Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. In Materials Research Society Symposium Proceedings. Vol. 1321. 2012. p. 217-222 https://doi.org/10.1557/opl.2011.1191
Noborisaka, Mayui ; Nagashima, So ; Hayashi, Hidetaka ; Ueda, Naoharu ; Kumagai, Kyoko ; Shirakura, Akira ; Suzuki, Tetsuya. / Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. Materials Research Society Symposium Proceedings. Vol. 1321 2012. pp. 217-222
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