Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method

Mayui Noborisaka; So Nagashima; Hidetaka Hayashi; Naoharu Ueda; Kyoko Kumagai; Akira Shirakura; Tetsuya Suzuki

doi:10.1557/opl.2011.1191

Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method

Mayui Noborisaka, So Nagashima, Hidetaka Hayashi, Naoharu Ueda, Kyoko Kumagai, Akira Shirakura, Tetsuya Suzuki

Department of Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

Silicon-based films have gained much interest as protective coatings for transparent polymeric materials. In this study, SiOC(-H) thin films were deposited on polycarbonate (PC) or Si substrates from trimethylsilane (TrMS) gas diluted with He gas by atmospheric pressure plasma enhanced CVD (AP-PECVD) method with varying substrate temperature, and transparency and hardness of the films were investigated. The films exhibited a good optical transparency with an optical transmittance of about 90% irrespective of the substrate temperature, and the hardness increased from 0.6 to 1.3 GPa as the substrate temperature increased from 60 to 140°C. The results are discussed in terms of chemical structural changes in the films according to the substrate temperature.

Original language	English
Title of host publication	Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011
Pages	217-222
Number of pages	6
DOIs	https://doi.org/10.1557/opl.2011.1191
Publication status	Published - 2012
Event	2011 MRS Spring Meeting - San Francisco, CA, United States Duration: 2011 Apr 25 → 2011 Apr 29

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	1321
ISSN (Print)	0272-9172

Other

Other	2011 MRS Spring Meeting
Country/Territory	United States
City	San Francisco, CA
Period	11/4/25 → 11/4/29

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1557/opl.2011.1191

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Noborisaka, M., Nagashima, S., Hayashi, H., Ueda, N., Kumagai, K., Shirakura, A., & Suzuki, T. (2012). Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. In Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011 (pp. 217-222). (Materials Research Society Symposium Proceedings; Vol. 1321). https://doi.org/10.1557/opl.2011.1191

Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. / Noborisaka, Mayui; Nagashima, So; Hayashi, Hidetaka et al.

Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011. 2012. p. 217-222 (Materials Research Society Symposium Proceedings; Vol. 1321).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Noborisaka, M, Nagashima, S, Hayashi, H, Ueda, N, Kumagai, K, Shirakura, A & Suzuki, T 2012, Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. in Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011. Materials Research Society Symposium Proceedings, vol. 1321, pp. 217-222, 2011 MRS Spring Meeting, San Francisco, CA, United States, 11/4/25. https://doi.org/10.1557/opl.2011.1191

Noborisaka M, Nagashima S, Hayashi H, Ueda N, Kumagai K, Shirakura A et al. Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method. In Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011. 2012. p. 217-222. (Materials Research Society Symposium Proceedings). doi: 10.1557/opl.2011.1191

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abstract = "Silicon-based films have gained much interest as protective coatings for transparent polymeric materials. In this study, SiOC(-H) thin films were deposited on polycarbonate (PC) or Si substrates from trimethylsilane (TrMS) gas diluted with He gas by atmospheric pressure plasma enhanced CVD (AP-PECVD) method with varying substrate temperature, and transparency and hardness of the films were investigated. The films exhibited a good optical transparency with an optical transmittance of about 90% irrespective of the substrate temperature, and the hardness increased from 0.6 to 1.3 GPa as the substrate temperature increased from 60 to 140°C. The results are discussed in terms of chemical structural changes in the films according to the substrate temperature.",

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AU - Noborisaka, Mayui

AU - Nagashima, So

AU - Hayashi, Hidetaka

AU - Ueda, Naoharu

AU - Kumagai, Kyoko

AU - Shirakura, Akira

AU - Suzuki, Tetsuya

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AB - Silicon-based films have gained much interest as protective coatings for transparent polymeric materials. In this study, SiOC(-H) thin films were deposited on polycarbonate (PC) or Si substrates from trimethylsilane (TrMS) gas diluted with He gas by atmospheric pressure plasma enhanced CVD (AP-PECVD) method with varying substrate temperature, and transparency and hardness of the films were investigated. The films exhibited a good optical transparency with an optical transmittance of about 90% irrespective of the substrate temperature, and the hardness increased from 0.6 to 1.3 GPa as the substrate temperature increased from 60 to 140°C. The results are discussed in terms of chemical structural changes in the films according to the substrate temperature.

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Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method

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