TY - JOUR
T1 - Effective mass anomalies in strained-Si thin films and crystals
AU - Yamauchi, Jun
N1 - Funding Information:
Manuscript received October 8, 2007. This work was supported in part by the Grants-in-Aid for Scientific Research (17064002 and 18063003) from MEXT and in part by the Research and Development for Next-Generation Information Technology of MEXT under Project RSS21. The review of this letter was arranged by Editor E. Sangiorgi.
PY - 2008/2
Y1 - 2008/2
N2 - Using first-principles calculations, effective mass for silicon channel region is investigated as a function of strain and substrate thickness. In {111} and {110} biaxially strained-Si, it is found that the longitudinal effective mass is extraordinarily enhanced for both thin films and crystals. This mass enhancement is caused by the change of the band structure with double minima into that with a single minimum due to strain and confinement. It is analytically shown that the effective mass diverges at the transition point. Further, we suggest the parameter regions of the strain, thickness, and confinement direction, which are most suitable for the experimental observation of the anomalies.
AB - Using first-principles calculations, effective mass for silicon channel region is investigated as a function of strain and substrate thickness. In {111} and {110} biaxially strained-Si, it is found that the longitudinal effective mass is extraordinarily enhanced for both thin films and crystals. This mass enhancement is caused by the change of the band structure with double minima into that with a single minimum due to strain and confinement. It is analytically shown that the effective mass diverges at the transition point. Further, we suggest the parameter regions of the strain, thickness, and confinement direction, which are most suitable for the experimental observation of the anomalies.
KW - Silicon
KW - Silicon-on-insulator (SOI) technology
KW - Simulation
KW - Strain
KW - Thin films
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U2 - 10.1109/LED.2007.914096
DO - 10.1109/LED.2007.914096
M3 - Article
AN - SCOPUS:39549107105
SN - 0741-3106
VL - 29
SP - 186
EP - 188
JO - IEEE Electron Device Letters
JF - IEEE Electron Device Letters
IS - 2
ER -