Effective-mass anomalies of strained silicon thin films: Surface and confinement effects

Jun Yamauchi, Shunichi Matsuno

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Using a first-principles calculation, we systematically investigated the effective-mass anomalies in 〈111〉- and 〈110〉-confined Si thin films. The surface terminators, which correspond to the interface between the Si channel and the insulator in real devices, do not have a significant effect on the effective mass anomalies. The effective-mass behaviors as a function of the substrate thickness and the strain is qualitatively well explained by the extended effective-mass approximation using the bulk effective-mass along the confinement direction.

Original languageEnglish
Pages (from-to)3273-3276
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number5 B
DOIs
Publication statusPublished - 2007 May 17

Keywords

  • Ab initio
  • Confinement
  • Density functional calculation
  • Effective mass
  • First-principles calculation
  • SOI
  • Si
  • Strain
  • Substrate thickness

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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