Effects of deep subsurface damages on surface nanostructure formation in laser recovery of grinded single-crystal silicon wafers

Keiichiro Niitsu, Jiwang Yan

Research output: Contribution to journalArticle

Abstract

A nanosecond pulsed Nd:YVO4 laser was irradiated on a boron-doped single-crystal silicon wafer after rough and fine grinding processes to recover the grinding-induced subsurface damages. The surface topography of samples was investigated by using a white-light interferometer, a scanning electron microscope, and an atomic force microscope; while the crystallinity was analyzed by a laser micro-Raman spectrometer. It was found that surface nanostructures were generated by the Mullins-Sekerka instability, which remained on the surface under recoil pressure and surface tension. The rough grinding-induced deep subsurface damages influenced the interface instability between liquid and solid silicon during recrystallization process. By increasing pulse width and decreasing laser peak irradiance, the subsurface damage was recovered and a flat surface with surface roughness of ~1 nm Sa was obtained. This study reveals important correlations among grinding-induced latent subsurface defects, laser peak irradiance and nanoscale surface topography formation in laser recovery, which contributes to high quality silicon wafer manufacturing.

Original languageEnglish
Pages (from-to)213-222
Number of pages10
JournalPrecision Engineering
Volume62
DOIs
Publication statusPublished - 2020 Mar

Fingerprint

Silicon wafers
Nanostructures
Single crystals
Recovery
Lasers
Surface topography
Interferometers
Surface tension
Boron
Spectrometers
Laser pulses
Microscopes
Electron microscopes
Surface roughness
Scanning
Silicon
Defects
Liquids

Keywords

  • Laser recovery
  • Latent defect
  • Nanodot structure
  • single-crystal silicon
  • Subsurface damage

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Effects of deep subsurface damages on surface nanostructure formation in laser recovery of grinded single-crystal silicon wafers. / Niitsu, Keiichiro; Yan, Jiwang.

In: Precision Engineering, Vol. 62, 03.2020, p. 213-222.

Research output: Contribution to journalArticle

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