Effects of frequency on the two-dimensional structure of capacitively coupled plasma in Ar

T. Kitajima, Y. Takeo, Nobuhiko Nakano, T. Makabe

Research output: Contribution to journalArticle

45 Citations (Scopus)

Abstract

A time-modulated and time-averaged two-dimensional (2D) profile of the net excitation rate of Ar(3p5) and Ar+(4p4D7/2) was observed in capacitively coupled plasma (CCP) in Ar as a function of the driving frequency (1-100 MHz) through the use of 2D-t optical emission spectroscopy (OES). A significant improvement in the detection efficiency was achieved for the time-resolved OES. Results are presented for the basic characteristics of 2D and 2D-t profiles of the net excitation rate in Ar from 1 to 100 MHz at 1.0 Torr. For comparison, 2D profiles in CCP between high frequency (13.56 MHz) and very high frequency (100 MHz) at 0.1 Torr and 25 mTorr under the same power dissipation are discussed. The advantages of VHF operation are described and discussed based on the radial uniformity and high density in CCP at low pressure. The appearance of a local emission peak at the edge of the rf electrode is observed in CCP, which is caused by changes in the sustaining mechanism due to increases in the driving frequency.

Original languageEnglish
Pages (from-to)5928-5936
Number of pages9
JournalJournal of Applied Physics
Volume84
Issue number11
Publication statusPublished - 1998 Dec 1

Fingerprint

optical emission spectroscopy
profiles
very high frequencies
sustaining
excitation
dissipation
low pressure
electrodes

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Effects of frequency on the two-dimensional structure of capacitively coupled plasma in Ar. / Kitajima, T.; Takeo, Y.; Nakano, Nobuhiko; Makabe, T.

In: Journal of Applied Physics, Vol. 84, No. 11, 01.12.1998, p. 5928-5936.

Research output: Contribution to journalArticle

@article{98c1e6bc17cb4853bc4421df50175ec3,
title = "Effects of frequency on the two-dimensional structure of capacitively coupled plasma in Ar",
abstract = "A time-modulated and time-averaged two-dimensional (2D) profile of the net excitation rate of Ar(3p5) and Ar+(4p4D7/2) was observed in capacitively coupled plasma (CCP) in Ar as a function of the driving frequency (1-100 MHz) through the use of 2D-t optical emission spectroscopy (OES). A significant improvement in the detection efficiency was achieved for the time-resolved OES. Results are presented for the basic characteristics of 2D and 2D-t profiles of the net excitation rate in Ar from 1 to 100 MHz at 1.0 Torr. For comparison, 2D profiles in CCP between high frequency (13.56 MHz) and very high frequency (100 MHz) at 0.1 Torr and 25 mTorr under the same power dissipation are discussed. The advantages of VHF operation are described and discussed based on the radial uniformity and high density in CCP at low pressure. The appearance of a local emission peak at the edge of the rf electrode is observed in CCP, which is caused by changes in the sustaining mechanism due to increases in the driving frequency.",
author = "T. Kitajima and Y. Takeo and Nobuhiko Nakano and T. Makabe",
year = "1998",
month = "12",
day = "1",
language = "English",
volume = "84",
pages = "5928--5936",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "11",

}

TY - JOUR

T1 - Effects of frequency on the two-dimensional structure of capacitively coupled plasma in Ar

AU - Kitajima, T.

AU - Takeo, Y.

AU - Nakano, Nobuhiko

AU - Makabe, T.

PY - 1998/12/1

Y1 - 1998/12/1

N2 - A time-modulated and time-averaged two-dimensional (2D) profile of the net excitation rate of Ar(3p5) and Ar+(4p4D7/2) was observed in capacitively coupled plasma (CCP) in Ar as a function of the driving frequency (1-100 MHz) through the use of 2D-t optical emission spectroscopy (OES). A significant improvement in the detection efficiency was achieved for the time-resolved OES. Results are presented for the basic characteristics of 2D and 2D-t profiles of the net excitation rate in Ar from 1 to 100 MHz at 1.0 Torr. For comparison, 2D profiles in CCP between high frequency (13.56 MHz) and very high frequency (100 MHz) at 0.1 Torr and 25 mTorr under the same power dissipation are discussed. The advantages of VHF operation are described and discussed based on the radial uniformity and high density in CCP at low pressure. The appearance of a local emission peak at the edge of the rf electrode is observed in CCP, which is caused by changes in the sustaining mechanism due to increases in the driving frequency.

AB - A time-modulated and time-averaged two-dimensional (2D) profile of the net excitation rate of Ar(3p5) and Ar+(4p4D7/2) was observed in capacitively coupled plasma (CCP) in Ar as a function of the driving frequency (1-100 MHz) through the use of 2D-t optical emission spectroscopy (OES). A significant improvement in the detection efficiency was achieved for the time-resolved OES. Results are presented for the basic characteristics of 2D and 2D-t profiles of the net excitation rate in Ar from 1 to 100 MHz at 1.0 Torr. For comparison, 2D profiles in CCP between high frequency (13.56 MHz) and very high frequency (100 MHz) at 0.1 Torr and 25 mTorr under the same power dissipation are discussed. The advantages of VHF operation are described and discussed based on the radial uniformity and high density in CCP at low pressure. The appearance of a local emission peak at the edge of the rf electrode is observed in CCP, which is caused by changes in the sustaining mechanism due to increases in the driving frequency.

UR - http://www.scopus.com/inward/record.url?scp=0000469449&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000469449&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0000469449

VL - 84

SP - 5928

EP - 5936

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 11

ER -