Abstract
Bismuth nanoclusters have been formed in optical grade silica glass (Corning 7940) by ion implantation which formed localized Bi:SiO2 composite in the near-surface region. Subsequent irradiation with 248 nm KrF excimer laser light modifies the distribution and chemical states of the implanted bismuth in the composite. Excimer laser irradiation causes not only photochemical reactions in the composite leaving a thin film of bismuth oxide on the surface, but also removal of the precipitated particles by both thermal and nonthermal desorption mechanisms from the surface.
| Original language | English |
|---|---|
| Pages (from-to) | 2687-2689 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 73 |
| Issue number | 18 |
| DOIs | |
| Publication status | Published - 1998 |
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ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
Cite this
Effects of KrF laser irradiation on Bi nanoclusters embedded in a-SiO2 by ion implantation. / Park, Seung Y.; Isobe, Tetsuhiko; Senna, Mamoru; Weeks, Robert A.; Zuhr, Raymond A.
In: Applied Physics Letters, Vol. 73, No. 18, 1998, p. 2687-2689.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Effects of KrF laser irradiation on Bi nanoclusters embedded in a-SiO2 by ion implantation
AU - Park, Seung Y.
AU - Isobe, Tetsuhiko
AU - Senna, Mamoru
AU - Weeks, Robert A.
AU - Zuhr, Raymond A.
PY - 1998
Y1 - 1998
N2 - Bismuth nanoclusters have been formed in optical grade silica glass (Corning 7940) by ion implantation which formed localized Bi:SiO2 composite in the near-surface region. Subsequent irradiation with 248 nm KrF excimer laser light modifies the distribution and chemical states of the implanted bismuth in the composite. Excimer laser irradiation causes not only photochemical reactions in the composite leaving a thin film of bismuth oxide on the surface, but also removal of the precipitated particles by both thermal and nonthermal desorption mechanisms from the surface.
AB - Bismuth nanoclusters have been formed in optical grade silica glass (Corning 7940) by ion implantation which formed localized Bi:SiO2 composite in the near-surface region. Subsequent irradiation with 248 nm KrF excimer laser light modifies the distribution and chemical states of the implanted bismuth in the composite. Excimer laser irradiation causes not only photochemical reactions in the composite leaving a thin film of bismuth oxide on the surface, but also removal of the precipitated particles by both thermal and nonthermal desorption mechanisms from the surface.
UR - http://www.scopus.com/inward/record.url?scp=0000148001&partnerID=8YFLogxK
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U2 - 10.1063/1.122554
DO - 10.1063/1.122554
M3 - Article
VL - 73
SP - 2687
EP - 2689
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 18
ER -