Abstract
Current status of ternary nitride films such as Ti1-X AlXN, Ti1-XCrXN, Ti1-X ZrXN, Cr1-XAlXN, Zr1-X AlXN and Ti1-XWXN was briefly summarized focused on micro-hardness with respect to different X value. The cathodic arc method is a specialized method in creating metastable ternary films which cannot be synthesized under stable thermodynamic conditions. The crystal structure and lattice parameter of ternary films change with X value and their physical properties correspondingly change as well. In this paper, the maximum hardness of ternary nitride films with particular X value was discussed based on the phase transition, analyzed by X-ray diffraction (XRD) and scanning and transmission electron microscopy (SEM and TEM).
Original language | English |
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Pages (from-to) | 234-240 |
Number of pages | 7 |
Journal | Surface and Coatings Technology |
Volume | 188-189 |
Issue number | 1-3 SPEC.ISS. |
DOIs | |
Publication status | Published - 2004 Nov 1 |
Keywords
- Cathodic arc method
- Micro-hardness
- Microstructure
- Second metal content
- Ternary nitride film
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry