Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter

Minoru Obara, Yuto Tanaka, Go Obara, Akira Zenidaka, Mitsuhiro Terakawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present results on near-field ablation using Mie resonance high dielectric constant particles with small size parameter for establishing a new downsizing technique for nanopatterning. In this article, we first describe a comparative study of near-field properties on substrates using metallic and dielectric nanoparticle. The results indicate that combination of particle and substrate for efficient localized near-field nano-processing is important for selecting either metallic or dielectric particle. We then demonstrate nanoablation using a Mie resonance high dielectric constant small particle. Theoretical calculations clarified that the maximal enhancement factor and spot diameter close to the smallest size are obtainable on both low-refractive-index (SiO2) and high-refractive-index (Si) substrates using a 200 nm Mie resonance dielectric particle (n∼2.7) at magnetic quadrupole mode with 400 nm excitation wavelength. Experimental results with 200 nm amorphous TiO 2 particles (n=2.66+0.024i) by 400 nm femtosecond laser irradiation verified that clear circular nanoholes with about 100 nm in diameter were fabricated on both substrates even with laser fluence lower than a half ablation threshold of the bare substrates. As for nanopatterning with two-dimensionally arrayed 200 nm amorphous TiO2particles, cohesion of nanoholes was observed in high laser fluence regime due to inter-particle near-field interaction.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Volume7751
DOIs
Publication statusPublished - 2010
Event18th International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers - Sofia, Bulgaria
Duration: 2010 Aug 302010 Sep 3

Other

Other18th International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers
CountryBulgaria
CitySofia
Period10/8/3010/9/3

Fingerprint

Femtosecond Laser
Dielectric Constant
Patterning
Ultrashort pulses
Permittivity
permittivity
Near-field
Substrates
Substrate
near fields
lasers
Ablation
Refractive index
Refractive Index
ablation
fluence
Lasers
Laser beam effects
refractivity
Laser

Keywords

  • femtosecond laser
  • Mie scattering
  • nanofabrication
  • near-field optics
  • surface plasmon

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Obara, M., Tanaka, Y., Obara, G., Zenidaka, A., & Terakawa, M. (2010). Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 7751). [77511V] https://doi.org/10.1117/12.881321

Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter. / Obara, Minoru; Tanaka, Yuto; Obara, Go; Zenidaka, Akira; Terakawa, Mitsuhiro.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7751 2010. 77511V.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Obara, M, Tanaka, Y, Obara, G, Zenidaka, A & Terakawa, M 2010, Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 7751, 77511V, 18th International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, Sofia, Bulgaria, 10/8/30. https://doi.org/10.1117/12.881321
Obara M, Tanaka Y, Obara G, Zenidaka A, Terakawa M. Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7751. 2010. 77511V https://doi.org/10.1117/12.881321
Obara, Minoru ; Tanaka, Yuto ; Obara, Go ; Zenidaka, Akira ; Terakawa, Mitsuhiro. / Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7751 2010.
@inproceedings{7aa7a29e81364c5bac51305babe1fac5,
title = "Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter",
abstract = "We present results on near-field ablation using Mie resonance high dielectric constant particles with small size parameter for establishing a new downsizing technique for nanopatterning. In this article, we first describe a comparative study of near-field properties on substrates using metallic and dielectric nanoparticle. The results indicate that combination of particle and substrate for efficient localized near-field nano-processing is important for selecting either metallic or dielectric particle. We then demonstrate nanoablation using a Mie resonance high dielectric constant small particle. Theoretical calculations clarified that the maximal enhancement factor and spot diameter close to the smallest size are obtainable on both low-refractive-index (SiO2) and high-refractive-index (Si) substrates using a 200 nm Mie resonance dielectric particle (n∼2.7) at magnetic quadrupole mode with 400 nm excitation wavelength. Experimental results with 200 nm amorphous TiO 2 particles (n=2.66+0.024i) by 400 nm femtosecond laser irradiation verified that clear circular nanoholes with about 100 nm in diameter were fabricated on both substrates even with laser fluence lower than a half ablation threshold of the bare substrates. As for nanopatterning with two-dimensionally arrayed 200 nm amorphous TiO2particles, cohesion of nanoholes was observed in high laser fluence regime due to inter-particle near-field interaction.",
keywords = "femtosecond laser, Mie scattering, nanofabrication, near-field optics, surface plasmon",
author = "Minoru Obara and Yuto Tanaka and Go Obara and Akira Zenidaka and Mitsuhiro Terakawa",
year = "2010",
doi = "10.1117/12.881321",
language = "English",
isbn = "9780819482426",
volume = "7751",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

}

TY - GEN

T1 - Efficient femtosecond laser surface patterning using high dielectric constant particles with small size parameter

AU - Obara, Minoru

AU - Tanaka, Yuto

AU - Obara, Go

AU - Zenidaka, Akira

AU - Terakawa, Mitsuhiro

PY - 2010

Y1 - 2010

N2 - We present results on near-field ablation using Mie resonance high dielectric constant particles with small size parameter for establishing a new downsizing technique for nanopatterning. In this article, we first describe a comparative study of near-field properties on substrates using metallic and dielectric nanoparticle. The results indicate that combination of particle and substrate for efficient localized near-field nano-processing is important for selecting either metallic or dielectric particle. We then demonstrate nanoablation using a Mie resonance high dielectric constant small particle. Theoretical calculations clarified that the maximal enhancement factor and spot diameter close to the smallest size are obtainable on both low-refractive-index (SiO2) and high-refractive-index (Si) substrates using a 200 nm Mie resonance dielectric particle (n∼2.7) at magnetic quadrupole mode with 400 nm excitation wavelength. Experimental results with 200 nm amorphous TiO 2 particles (n=2.66+0.024i) by 400 nm femtosecond laser irradiation verified that clear circular nanoholes with about 100 nm in diameter were fabricated on both substrates even with laser fluence lower than a half ablation threshold of the bare substrates. As for nanopatterning with two-dimensionally arrayed 200 nm amorphous TiO2particles, cohesion of nanoholes was observed in high laser fluence regime due to inter-particle near-field interaction.

AB - We present results on near-field ablation using Mie resonance high dielectric constant particles with small size parameter for establishing a new downsizing technique for nanopatterning. In this article, we first describe a comparative study of near-field properties on substrates using metallic and dielectric nanoparticle. The results indicate that combination of particle and substrate for efficient localized near-field nano-processing is important for selecting either metallic or dielectric particle. We then demonstrate nanoablation using a Mie resonance high dielectric constant small particle. Theoretical calculations clarified that the maximal enhancement factor and spot diameter close to the smallest size are obtainable on both low-refractive-index (SiO2) and high-refractive-index (Si) substrates using a 200 nm Mie resonance dielectric particle (n∼2.7) at magnetic quadrupole mode with 400 nm excitation wavelength. Experimental results with 200 nm amorphous TiO 2 particles (n=2.66+0.024i) by 400 nm femtosecond laser irradiation verified that clear circular nanoholes with about 100 nm in diameter were fabricated on both substrates even with laser fluence lower than a half ablation threshold of the bare substrates. As for nanopatterning with two-dimensionally arrayed 200 nm amorphous TiO2particles, cohesion of nanoholes was observed in high laser fluence regime due to inter-particle near-field interaction.

KW - femtosecond laser

KW - Mie scattering

KW - nanofabrication

KW - near-field optics

KW - surface plasmon

UR - http://www.scopus.com/inward/record.url?scp=79953244253&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79953244253&partnerID=8YFLogxK

U2 - 10.1117/12.881321

DO - 10.1117/12.881321

M3 - Conference contribution

AN - SCOPUS:79953244253

SN - 9780819482426

VL - 7751

BT - Proceedings of SPIE - The International Society for Optical Engineering

ER -