Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system

Surudee Treetepvijit, Suchada Chuanuwatanakul, Yasuaki Einaga, Rika Sato, Orawon Chailapakul

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

The electrochemical analysis of tetracycline was investigated using nickel-implanted boron-doped diamond thin film electrode by cyclic voltammetry and amperometry with a flow injection system. Cyclic voltammetry was used to study the electrochemical oxidation of tetracycline. Comparison experiments were carried out using as-deposited boron-doped diamond thin film electrode (BDD). Nickel-implanted boron-doped diamond thin film electrode (Ni-DIA) provided well-resolved oxidation irreversible cyclic voltammograms. The current signals were higher than those obtained using the as-deposited BDD electrode. Results using nickel-implanted boron-doped diamond thin film electrode in flow injection system coupled with amperometric detection are presented. The optimum potential for tetracycline was 1.55 V versus Ag/AgCl. The linear range of 1.0 to 100 μM and the detection limit of 10 nM were obtained. In addition, the application for drug formulation was also investigated. 2005

Original languageEnglish
Pages (from-to)531-535
Number of pages5
JournalAnalytical Sciences
Volume21
Issue number5
DOIs
Publication statusPublished - 2005 May

Fingerprint

Boron
Diamond films
Tetracycline
Nickel
Thin films
Electrodes
Cyclic voltammetry
Electrochemical oxidation
Oxidation
Experiments

ASJC Scopus subject areas

  • Analytical Chemistry

Cite this

Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system. / Treetepvijit, Surudee; Chuanuwatanakul, Suchada; Einaga, Yasuaki; Sato, Rika; Chailapakul, Orawon.

In: Analytical Sciences, Vol. 21, No. 5, 05.2005, p. 531-535.

Research output: Contribution to journalArticle

Treetepvijit, Surudee ; Chuanuwatanakul, Suchada ; Einaga, Yasuaki ; Sato, Rika ; Chailapakul, Orawon. / Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system. In: Analytical Sciences. 2005 ; Vol. 21, No. 5. pp. 531-535.
@article{317efce480a846beb5beb722379945b0,
title = "Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system",
abstract = "The electrochemical analysis of tetracycline was investigated using nickel-implanted boron-doped diamond thin film electrode by cyclic voltammetry and amperometry with a flow injection system. Cyclic voltammetry was used to study the electrochemical oxidation of tetracycline. Comparison experiments were carried out using as-deposited boron-doped diamond thin film electrode (BDD). Nickel-implanted boron-doped diamond thin film electrode (Ni-DIA) provided well-resolved oxidation irreversible cyclic voltammograms. The current signals were higher than those obtained using the as-deposited BDD electrode. Results using nickel-implanted boron-doped diamond thin film electrode in flow injection system coupled with amperometric detection are presented. The optimum potential for tetracycline was 1.55 V versus Ag/AgCl. The linear range of 1.0 to 100 μM and the detection limit of 10 nM were obtained. In addition, the application for drug formulation was also investigated. 2005",
author = "Surudee Treetepvijit and Suchada Chuanuwatanakul and Yasuaki Einaga and Rika Sato and Orawon Chailapakul",
year = "2005",
month = "5",
doi = "10.2116/analsci.21.531",
language = "English",
volume = "21",
pages = "531--535",
journal = "Analytical Sciences",
issn = "0910-6340",
publisher = "Japan Society for Analytical Chemistry",
number = "5",

}

TY - JOUR

T1 - Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system

AU - Treetepvijit, Surudee

AU - Chuanuwatanakul, Suchada

AU - Einaga, Yasuaki

AU - Sato, Rika

AU - Chailapakul, Orawon

PY - 2005/5

Y1 - 2005/5

N2 - The electrochemical analysis of tetracycline was investigated using nickel-implanted boron-doped diamond thin film electrode by cyclic voltammetry and amperometry with a flow injection system. Cyclic voltammetry was used to study the electrochemical oxidation of tetracycline. Comparison experiments were carried out using as-deposited boron-doped diamond thin film electrode (BDD). Nickel-implanted boron-doped diamond thin film electrode (Ni-DIA) provided well-resolved oxidation irreversible cyclic voltammograms. The current signals were higher than those obtained using the as-deposited BDD electrode. Results using nickel-implanted boron-doped diamond thin film electrode in flow injection system coupled with amperometric detection are presented. The optimum potential for tetracycline was 1.55 V versus Ag/AgCl. The linear range of 1.0 to 100 μM and the detection limit of 10 nM were obtained. In addition, the application for drug formulation was also investigated. 2005

AB - The electrochemical analysis of tetracycline was investigated using nickel-implanted boron-doped diamond thin film electrode by cyclic voltammetry and amperometry with a flow injection system. Cyclic voltammetry was used to study the electrochemical oxidation of tetracycline. Comparison experiments were carried out using as-deposited boron-doped diamond thin film electrode (BDD). Nickel-implanted boron-doped diamond thin film electrode (Ni-DIA) provided well-resolved oxidation irreversible cyclic voltammograms. The current signals were higher than those obtained using the as-deposited BDD electrode. Results using nickel-implanted boron-doped diamond thin film electrode in flow injection system coupled with amperometric detection are presented. The optimum potential for tetracycline was 1.55 V versus Ag/AgCl. The linear range of 1.0 to 100 μM and the detection limit of 10 nM were obtained. In addition, the application for drug formulation was also investigated. 2005

UR - http://www.scopus.com/inward/record.url?scp=19944408361&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=19944408361&partnerID=8YFLogxK

U2 - 10.2116/analsci.21.531

DO - 10.2116/analsci.21.531

M3 - Article

VL - 21

SP - 531

EP - 535

JO - Analytical Sciences

JF - Analytical Sciences

SN - 0910-6340

IS - 5

ER -