Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system

Surudee Treetepvijit, Suchada Chuanuwatanakul, Yasuaki Einaga, Rika Sato, Orawon Chailapakul

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Abstract

The electrochemical analysis of tetracycline was investigated using nickel-implanted boron-doped diamond thin film electrode by cyclic voltammetry and amperometry with a flow injection system. Cyclic voltammetry was used to study the electrochemical oxidation of tetracycline. Comparison experiments were carried out using as-deposited boron-doped diamond thin film electrode (BDD). Nickel-implanted boron-doped diamond thin film electrode (Ni-DIA) provided well-resolved oxidation irreversible cyclic voltammograms. The current signals were higher than those obtained using the as-deposited BDD electrode. Results using nickel-implanted boron-doped diamond thin film electrode in flow injection system coupled with amperometric detection are presented. The optimum potential for tetracycline was 1.55 V versus Ag/AgCl. The linear range of 1.0 to 100 μM and the detection limit of 10 nM were obtained. In addition, the application for drug formulation was also investigated. 2005

Original languageEnglish
Pages (from-to)531-535
Number of pages5
JournalAnalytical Sciences
Volume21
Issue number5
DOIs
Publication statusPublished - 2005 May

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ASJC Scopus subject areas

  • Analytical Chemistry

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