Electrochemical performance of angstrom level flat sputtered carbon film consisting of sp2 and sp3 mixed bonds

Osamu Niwa, Jianbo Jia, Yukari Sato, Dai Kato, Ryoji Kurita, Kenichi Maruyama, Koji Suzuki, Shigeru Hirono

Research output: Contribution to journalArticle

96 Citations (Scopus)

Abstract

We have developed ultra-flat carbon film electrodes with a wide potential window and a low capacitive current by the electron cyclotron resonance (ECR) sputtering method. The film consists of sp2 and sp3 bonds (sp3/sp2 ratio = 0.702) and is sufficiently conductive for electrochemical measurements without doping. The film has average roughness of 0.7 Å, which is much flatter than that of nanocrystalline diamond film. The potential limit of ECR sputtered carbon (current limit < ±500 μA/cm2) in the positive direction is 2.0 V vs Ag/AgCl, which is slightly lower than that of boron-doped diamond (2.1 V) and much wider than that of a glassy carbon (GC) electrode (1.7 V). In contrast, a much wider potential window can be obtained in the negative direction. The capacitive current is also much lower than that of a GC electrode due to the ultra-flat surface and the low number of oxygen-containing groups at the film surface. ECR sputtered carbon film can be used to measure each base of oligonucleotides by electrochemical oxidation without any pretreatment. The ultra-flat surface and low surface oxygen concentration suppress fouling with electroactive species, such as oligonucleotides, NADH, and bisphenol A.

Original languageEnglish
Pages (from-to)7144-7145
Number of pages2
JournalJournal of the American Chemical Society
Volume128
Issue number22
DOIs
Publication statusPublished - 2006 Jun 7

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Carbon films
Electron cyclotron resonance
Cyclotrons
Carbon
Oligonucleotides
Glassy carbon
Electrodes
Diamond
Electrons
Oxygen
Boron
Electrochemical oxidation
Diamond films
Fouling
NAD
Sputtering
Diamonds
Surface roughness
Doping (additives)
Direction compound

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Electrochemical performance of angstrom level flat sputtered carbon film consisting of sp2 and sp3 mixed bonds. / Niwa, Osamu; Jia, Jianbo; Sato, Yukari; Kato, Dai; Kurita, Ryoji; Maruyama, Kenichi; Suzuki, Koji; Hirono, Shigeru.

In: Journal of the American Chemical Society, Vol. 128, No. 22, 07.06.2006, p. 7144-7145.

Research output: Contribution to journalArticle

Niwa, O, Jia, J, Sato, Y, Kato, D, Kurita, R, Maruyama, K, Suzuki, K & Hirono, S 2006, 'Electrochemical performance of angstrom level flat sputtered carbon film consisting of sp2 and sp3 mixed bonds', Journal of the American Chemical Society, vol. 128, no. 22, pp. 7144-7145. https://doi.org/10.1021/ja060609l
Niwa, Osamu ; Jia, Jianbo ; Sato, Yukari ; Kato, Dai ; Kurita, Ryoji ; Maruyama, Kenichi ; Suzuki, Koji ; Hirono, Shigeru. / Electrochemical performance of angstrom level flat sputtered carbon film consisting of sp2 and sp3 mixed bonds. In: Journal of the American Chemical Society. 2006 ; Vol. 128, No. 22. pp. 7144-7145.
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