Electron beam assisted chemical etching of single crystal diamond substrates

Jun Taniguchi, Iwao Miyamoto, Naoto Ohno, Satoshi Honda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Electron beam assisted chemical etching (EBACE) with oxygen gas is applicable to direct fine patterning of single crystal diamond substrates. A scanning electron microscope (SEM) combined with an oxygen gas introduction system was used for EBACE of diamond. In order to prevent surface charge-up during etching and SEM observation, a hydrocarbon contamination layer, which has conductivity and can be deposited during electron beam irradiation using oil vapor in a vacuum system, was used. Etching characteristics of single crystal diamond substrates by EBACE with oxygen gas were mainly investigated. It was found by in-situ SEM observation that hole, line and rectangular patterns with several μm2 area and sub-μm depth into the diamond substrates were successfully fabricated by EBACE utilizing spot, line and raster scanning modes of the SEM. The depths of holes and rectangular patterns were proportional to electron beam exposure times. Etched areas of line and rectangular patterns were larger than scanned area. An etching yield of 1.99 × 10-2 carbon atoms of diamond per electron has been observed for EBACE using oxygen gas.

Original languageEnglish
Title of host publicationJapanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers
EditorsY. Aoyagi, N. Atoda, T. Fukui, M. Komuro, M. Kotera, al et al
Pages6347-6695
Number of pages349
Volume35
Edition12 B
Publication statusPublished - 1996 Dec
Externally publishedYes
EventProceedings of the 1996 9th International MicroProcess Conference, MPC'96 - Kyushu, Jpn
Duration: 1996 Jul 81996 Jul 11

Other

OtherProceedings of the 1996 9th International MicroProcess Conference, MPC'96
CityKyushu, Jpn
Period96/7/896/7/11

Fingerprint

Electron beams
Etching
Diamonds
Single crystals
Substrates
Scanning
Electron microscopes
Oxygen
Gases
Surface charge
Contamination
Hydrocarbons
Vapors
Irradiation
Vacuum
Atoms
Carbon
Electrons

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Taniguchi, J., Miyamoto, I., Ohno, N., & Honda, S. (1996). Electron beam assisted chemical etching of single crystal diamond substrates. In Y. Aoyagi, N. Atoda, T. Fukui, M. Komuro, M. Kotera, & A. et al (Eds.), Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers (12 B ed., Vol. 35, pp. 6347-6695)

Electron beam assisted chemical etching of single crystal diamond substrates. / Taniguchi, Jun; Miyamoto, Iwao; Ohno, Naoto; Honda, Satoshi.

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers. ed. / Y. Aoyagi; N. Atoda; T. Fukui; M. Komuro; M. Kotera; al et al. Vol. 35 12 B. ed. 1996. p. 6347-6695.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Taniguchi, J, Miyamoto, I, Ohno, N & Honda, S 1996, Electron beam assisted chemical etching of single crystal diamond substrates. in Y Aoyagi, N Atoda, T Fukui, M Komuro, M Kotera & A et al (eds), Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers. 12 B edn, vol. 35, pp. 6347-6695, Proceedings of the 1996 9th International MicroProcess Conference, MPC'96, Kyushu, Jpn, 96/7/8.
Taniguchi J, Miyamoto I, Ohno N, Honda S. Electron beam assisted chemical etching of single crystal diamond substrates. In Aoyagi Y, Atoda N, Fukui T, Komuro M, Kotera M, et al A, editors, Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers. 12 B ed. Vol. 35. 1996. p. 6347-6695
Taniguchi, Jun ; Miyamoto, Iwao ; Ohno, Naoto ; Honda, Satoshi. / Electron beam assisted chemical etching of single crystal diamond substrates. Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers. editor / Y. Aoyagi ; N. Atoda ; T. Fukui ; M. Komuro ; M. Kotera ; al et al. Vol. 35 12 B. ed. 1996. pp. 6347-6695
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