Enhanced Si and B diffusion in semiconductor-grade SiO2 and the effect of strain on diffusion

Masashi Uematsu, Hiroyuki Kageshima, Shigeto Fukatsu, Kohei M. Itoh, Kenji Shiraishi, Minoru Otani, Atsushi Oshiyama

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

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Physics & Astronomy

Chemical Compounds

Engineering & Materials Science