Abstract
The phase errors in 100-GHz spacing, 8-ch, Si-wire arrayedwaveguide gratings (AWG) fabricated by ArF-immersion photolithography were measured by the frequency-domain interference method. To our knowledge, this is the first time phase error measurements in a Si-wire AWG have been performed. By comparing the reconstructed transmission spectrum to the directly measured spectrum, the accuracy of this phase error measurement was confirmed. The average phase error in the AWGs on 6 chips was 0.27π radian, and this value is equivalent to a fluctuation in the effective refractive index of 1.1 × 10<sup>−4</sup>.
| Original language | English |
|---|---|
| Journal | IEICE Electronics Express |
| Volume | 12 |
| Issue number | 7 |
| DOIs | |
| Publication status | Published - 2015 Apr 10 |
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Keywords
- Phase error measurement
- Si-wire arrayed-waveguide grating
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
Cite this
Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography. / Muramatsu, Kyosuke; Asakura, Hideaki; Suzuki, Keijiro; Tanizawa, Ken; Toyama, Munehiro; Ohtsuka, Minoru; Yokoyama, Nobuyuki; Matsumaro, Kazuyuki; Seki, Miyoshi; Koshino, Keiji; Ikeda, Kazuhiro; Namiki, Shu; Kawashima, Hitoshi; Tsuda, Hiroyuki.
In: IEICE Electronics Express, Vol. 12, No. 7, 10.04.2015.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography
AU - Muramatsu, Kyosuke
AU - Asakura, Hideaki
AU - Suzuki, Keijiro
AU - Tanizawa, Ken
AU - Toyama, Munehiro
AU - Ohtsuka, Minoru
AU - Yokoyama, Nobuyuki
AU - Matsumaro, Kazuyuki
AU - Seki, Miyoshi
AU - Koshino, Keiji
AU - Ikeda, Kazuhiro
AU - Namiki, Shu
AU - Kawashima, Hitoshi
AU - Tsuda, Hiroyuki
PY - 2015/4/10
Y1 - 2015/4/10
N2 - The phase errors in 100-GHz spacing, 8-ch, Si-wire arrayedwaveguide gratings (AWG) fabricated by ArF-immersion photolithography were measured by the frequency-domain interference method. To our knowledge, this is the first time phase error measurements in a Si-wire AWG have been performed. By comparing the reconstructed transmission spectrum to the directly measured spectrum, the accuracy of this phase error measurement was confirmed. The average phase error in the AWGs on 6 chips was 0.27π radian, and this value is equivalent to a fluctuation in the effective refractive index of 1.1 × 10−4.
AB - The phase errors in 100-GHz spacing, 8-ch, Si-wire arrayedwaveguide gratings (AWG) fabricated by ArF-immersion photolithography were measured by the frequency-domain interference method. To our knowledge, this is the first time phase error measurements in a Si-wire AWG have been performed. By comparing the reconstructed transmission spectrum to the directly measured spectrum, the accuracy of this phase error measurement was confirmed. The average phase error in the AWGs on 6 chips was 0.27π radian, and this value is equivalent to a fluctuation in the effective refractive index of 1.1 × 10−4.
KW - Phase error measurement
KW - Si-wire arrayed-waveguide grating
UR - http://www.scopus.com/inward/record.url?scp=84927584033&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84927584033&partnerID=8YFLogxK
U2 - 10.1587/elex.12.20150019
DO - 10.1587/elex.12.20150019
M3 - Article
AN - SCOPUS:84927584033
VL - 12
JO - IEICE Electronics Express
JF - IEICE Electronics Express
SN - 1349-2543
IS - 7
ER -