Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography

Kyosuke Muramatsu; Hideaki Asakura; Keijiro Suzuki; Ken Tanizawa; Munehiro Toyama; Minoru Ohtsuka; Nobuyuki Yokoyama; Kazuyuki Matsumaro; Miyoshi Seki; Keiji Koshino; Kazuhiro Ikeda; Shu Namiki; Hitoshi Kawashima; Hiroyuki Tsuda

doi:10.1587/elex.12.20150019

Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography

Kyosuke Muramatsu, Hideaki Asakura, Keijiro Suzuki, Ken Tanizawa, Munehiro Toyama, Minoru Ohtsuka, Nobuyuki Yokoyama, Kazuyuki Matsumaro, Miyoshi Seki, Keiji Koshino, Kazuhiro Ikeda, Shu Namiki, Hitoshi Kawashima, Hiroyuki Tsuda

Department of Electronics and Electrical Engineering

Research output: Contribution to journal › Article

3 Citations (Scopus)

Abstract

The phase errors in 100-GHz spacing, 8-ch, Si-wire arrayedwaveguide gratings (AWG) fabricated by ArF-immersion photolithography were measured by the frequency-domain interference method. To our knowledge, this is the first time phase error measurements in a Si-wire AWG have been performed. By comparing the reconstructed transmission spectrum to the directly measured spectrum, the accuracy of this phase error measurement was confirmed. The average phase error in the AWGs on 6 chips was 0.27π radian, and this value is equivalent to a fluctuation in the effective refractive index of 1.1 × 10⁻⁴.

Original language	English
Article number	20150019
Journal	IEICE Electronics Express
Volume	12
Issue number	7
DOIs	https://doi.org/10.1587/elex.12.20150019
Publication status	Published - 2015 Apr 10

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Keywords

Phase error measurement
Si-wire arrayed-waveguide grating

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

Muramatsu, K., Asakura, H., Suzuki, K., Tanizawa, K., Toyama, M., Ohtsuka, M., Yokoyama, N., Matsumaro, K., Seki, M., Koshino, K., Ikeda, K., Namiki, S., Kawashima, H., & Tsuda, H. (2015). Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography. IEICE Electronics Express, 12(7), [20150019]. https://doi.org/10.1587/elex.12.20150019

Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography. / Muramatsu, Kyosuke; Asakura, Hideaki; Suzuki, Keijiro; Tanizawa, Ken; Toyama, Munehiro; Ohtsuka, Minoru; Yokoyama, Nobuyuki; Matsumaro, Kazuyuki; Seki, Miyoshi; Koshino, Keiji; Ikeda, Kazuhiro; Namiki, Shu; Kawashima, Hitoshi; Tsuda, Hiroyuki.

In: IEICE Electronics Express, Vol. 12, No. 7, 20150019, 10.04.2015.

Research output: Contribution to journal › Article

Muramatsu, K, Asakura, H, Suzuki, K, Tanizawa, K, Toyama, M, Ohtsuka, M, Yokoyama, N, Matsumaro, K, Seki, M, Koshino, K, Ikeda, K, Namiki, S, Kawashima, H & Tsuda, H 2015, 'Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography', IEICE Electronics Express, vol. 12, no. 7, 20150019. https://doi.org/10.1587/elex.12.20150019

Muramatsu, Kyosuke ; Asakura, Hideaki ; Suzuki, Keijiro ; Tanizawa, Ken ; Toyama, Munehiro ; Ohtsuka, Minoru ; Yokoyama, Nobuyuki ; Matsumaro, Kazuyuki ; Seki, Miyoshi ; Koshino, Keiji ; Ikeda, Kazuhiro ; Namiki, Shu ; Kawashima, Hitoshi ; Tsuda, Hiroyuki. / Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography. In: IEICE Electronics Express. 2015 ; Vol. 12, No. 7.

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Access to Document

10.1587/elex.12.20150019